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Thin Film Processes
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TOTAL DOCUMENTS
21
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7
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Published By Elsevier
9780080524214
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Ion Beam Etching
Thin Film Processes
◽
10.1016/b978-0-08-052421-4.50019-8
◽
1991
◽
pp. 749-782
◽
Cited By ~ 4
Author(s):
P. REESE PUCKETT
◽
STEPHEN L. MICHEL
◽
WILLIAM E. HUGHES
Keyword(s):
Ion Beam
◽
Ion Beam Etching
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The Cathodic Arc Plasma Deposition of Thin Films
Thin Film Processes
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10.1016/b978-0-08-052421-4.50010-1
◽
1991
◽
pp. 209-280
◽
Cited By ~ 5
Author(s):
PHILIP C. JOHNSON
Keyword(s):
Thin Films
◽
Plasma Deposition
◽
Arc Plasma
◽
Cathodic Arc
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Selected Area Processing
Thin Film Processes
◽
10.1016/b978-0-08-052421-4.50017-4
◽
1991
◽
pp. 621-670
◽
Cited By ~ 3
Author(s):
THOMAS M. MAYER
◽
SUSAN D. ALLEN
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Plasma-Enhanced Chemical Vapor Deposition
Thin Film Processes
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10.1016/b978-0-08-052421-4.50015-0
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1991
◽
pp. 525-564
◽
Cited By ~ 9
Author(s):
RAFAEL REIF
◽
WERNER KERN
Keyword(s):
Chemical Vapor Deposition
◽
Vapor Deposition
◽
Chemical Vapor
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Laser-Driven Etching
Thin Film Processes
◽
10.1016/b978-0-08-052421-4.50020-4
◽
1991
◽
pp. 783-856
◽
Cited By ~ 3
Author(s):
CAROL I.H. ASHBY
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Thermal Chemical Vapor Deposition
Thin Film Processes
◽
10.1016/b978-0-08-052421-4.50011-3
◽
1991
◽
pp. 283-368
◽
Cited By ~ 17
Author(s):
KLAVS F. JENSEN
◽
WERNER KERN
Keyword(s):
Chemical Vapor Deposition
◽
Vapor Deposition
◽
Chemical Vapor
◽
Thermal Chemical Vapor Deposition
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Copyright
Thin Film Processes
◽
10.1016/b978-0-08-052421-4.50002-2
◽
1991
◽
pp. iv
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Molecular Beam Epitaxy
Thin Film Processes
◽
10.1016/b978-0-08-052421-4.50008-3
◽
1991
◽
pp. 133-175
◽
Cited By ~ 3
Author(s):
P.P. CHOW
Keyword(s):
Molecular Beam Epitaxy
◽
Molecular Beam
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Preface
Thin Film Processes
◽
10.1016/b978-0-08-052421-4.50004-6
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1991
◽
pp. xiii
◽
Cited By ~ 1
Author(s):
John L. Vossen
◽
Werner Kern
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Sputter Deposition Processes
Thin Film Processes
◽
10.1016/b978-0-08-052421-4.50009-5
◽
1991
◽
pp. 177-208
◽
Cited By ~ 17
Author(s):
ROBERT PARSONS
Keyword(s):
Sputter Deposition
◽
Deposition Processes
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