Thickness Distribution of Nitride Coatings Deposited by Cathodic Arc Evaporation and the Effect of Increased Working Gas Pressure

2005 ◽  
pp. 11-17
Author(s):  
Martin Balzer ◽  
Hermann A. Jehn ◽  
Clive Davies ◽  
Peter Hatto ◽  
Francesca Passaretti
1993 ◽  
Vol 61 (1-3) ◽  
pp. 223-226 ◽  
Author(s):  
Robert R. Aharonov ◽  
Bernard F. Coll ◽  
Raymond P. Fontana

2016 ◽  
Vol 368 ◽  
pp. 77-81
Author(s):  
Miroslav Béger ◽  
Jozef Sondor ◽  
Martin Sahul ◽  
Paulína Zacková ◽  
Marián Haršáni ◽  
...  

The article deals with the influence of different deposition parameters on the selected properties of AlCrN/Si3N4 nanocomposite coatings. Bias voltage, cathodes currents and working gas pressure were changed during the deposition process. All coatings were deposited using Lateral Rotating Cathodes (LARC®) process that belongs to the group of cathodic arc evaporation PVD technologies. In comparison with the typical cathodic arc evaporation process which usually uses planar targets the LARC® process utilizes rotational cathodes that are positioned close to each other. Nanohardness, Young's modulus, thickness and residual stresses were determinated in order to evaluate the influence of deposition parameters on these coatings properties


2011 ◽  
Vol 205 (21-22) ◽  
pp. 5116-5123 ◽  
Author(s):  
David Rafaja ◽  
Conrad Polzer ◽  
Gerhard Schreiber ◽  
Peter Polcik ◽  
Martin Kathrein

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