Manipulating Cu Nanoparticle Surface Oxidation States Tunes Catalytic Selectivity toward CH 4 or C 2+ Products in CO 2 Electroreduction

2021 ◽  
pp. 2101424
Author(s):  
Qikui Fan ◽  
Xue Zhang ◽  
Xiaohu Ge ◽  
Licheng Bai ◽  
Dongsheng He ◽  
...  
1986 ◽  
Vol 172 (2) ◽  
pp. 455-465 ◽  
Author(s):  
D. Schmeisser ◽  
R.D. Schnell ◽  
A. Bogen ◽  
F.J. Himpsel ◽  
D. Rieger ◽  
...  

L 23 M 45 M 45 /L 23 M 23 M 45 ,L 23 M 45 M 45 /L 23 M 23 M 23 and L 23 M 23 M 23 Auger intensity ratios in transition metal oxides and sulphides are shown to be directly related to the number of valence electrons in the metal as well as to its oxidation state. The metal Auger intensity ratios provide a unique probe, independent of O(KLL) intensity, to study surface oxidation states of metals. These intensity ratios have been effectively employed to investigate surface oxidation of nickel, iron and copper. The oxidation studies have unravelled some interesting aspects of surface oxidation.


Langmuir ◽  
2004 ◽  
Vol 20 (1) ◽  
pp. 260-262 ◽  
Author(s):  
James L. Gole ◽  
Brian D. Shinall ◽  
Alexei V. Iretskii ◽  
Mark G. White ◽  
Ann S. Erickson

Langmuir ◽  
2013 ◽  
Vol 29 (40) ◽  
pp. 12452-12462 ◽  
Author(s):  
Yuen-Yan Fong ◽  
Jason R. Gascooke ◽  
Bradley R. Visser ◽  
Hugh H. Harris ◽  
Bruce C. C. Cowie ◽  
...  

Author(s):  
Swapan Jana ◽  
Anil Krishna Debnath ◽  
Veerender Putta ◽  
Jitendra Bahadur ◽  
Anil Kumar Chauhan ◽  
...  

1993 ◽  
Vol 317 ◽  
Author(s):  
P.K. Wu ◽  
L.E. Kolaya ◽  
D.J. Duquette ◽  
J.B. Hudson

ABSTRACTThe chemical compatibility between MoSi2 and Al2O3 at 1300° C was examined using sputter deposited MoSi2 films, 0.7 μm thick, on sapphire and on polycrystalline alumina. The oxidation behavior of the sputter deposited films was found to be identical to that of bulk MoSi2. The oxidation products of the MoSi2 are Si oxides and lower suicides of Mo. MoO3 is formed and sublimes at the free surface. Oxidation is found to occur at the SiO2/MoSi2 interface. Just beneath this interface, suicides of mo and two oxidation states of Si were identified. No reaction between MoSi2 and alumina was found. In the case of a sapphire substrate, after mo was completely eliminated from the interface, silica reacted with the substrate and eventually phase separated into high- and low-silica phases. Nucleation, growth and coalescence of high-silica precipitates were observed.


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