ChemInform Abstract: ENERGY PARTITIONING IN THE DISSOCIATION OF CYANOGEN AT 193 NM

Chemischer Informationsdienst ◽

10.1002/chin.198226098 ◽

1982 ◽

Vol 13 (26) ◽

Author(s):

J. B. HALPERN ◽

W. M. JACKSON

Keyword(s):

Energy Partitioning ◽

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Formation of electronically excited nitric oxide and energy partitioning in the 193-nm photolysis of the nitric oxide dimer

The Journal of Physical Chemistry ◽

10.1021/j100259a004 ◽

1985 ◽

Vol 89 (13) ◽

pp. 2725-2727 ◽

Author(s):

O. Kajimoto ◽

K. Honma ◽

T. Kobayashi

Keyword(s):

Nitric Oxide ◽

Energy Partitioning ◽

Electronically Excited ◽

Nitric Oxide Dimer ◽

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Energy partitioning in the dissociation of cyanogen at 193 nm

The Journal of Physical Chemistry ◽

10.1021/j100395a028 ◽

1982 ◽

Vol 86 (6) ◽

pp. 973-976 ◽

Author(s):

Joshua B. Halpern ◽

William M. Jackson

Keyword(s):

Energy Partitioning ◽

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Intramolecular interactions in N-methylsalicylaldimine and its anion. A semi-empirical energy partitioning analysis

Journal de Chimie Physique ◽

10.1051/jcp/1981780127 ◽

1981 ◽

Vol 78 ◽

pp. 127-130 ◽

Author(s):

Salavatore Millefiori ◽

Arcangelo Millefiori

Keyword(s):

Energy Partitioning ◽

Intramolecular Interactions ◽

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Excimer Projection Lithography at 193-nm Wavelength

10.21236/ada201988 ◽

1988 ◽

Author(s):

M. Rothschild ◽

D. J. Ehrlich

Keyword(s):

Projection Lithography ◽

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Amplification of fibre Bragg grating reflectivity by post-writing exposure with a 193 nm ArF laser

Electronics Letters ◽

10.1049/el:19940780 ◽

1994 ◽

Vol 30 (14) ◽

pp. 1133-1134 ◽

Author(s):

P. E. Dyer ◽

K. C. Byron ◽

R. J. Farley ◽

R. Giedl

Keyword(s):

Bragg Grating ◽

Fibre Bragg Grating ◽

Arf Laser ◽

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Inorganic Si-O-C Antireflection Coating at 193 nm for Cu Dual Damascene Process

Journal of The Electrochemical Society ◽

10.1149/1.1528944 ◽

2003 ◽

Vol 150 (1) ◽

pp. G58 ◽

Author(s):

Sang-Yun Lee ◽

Yong-Bae Kim ◽

Jeong Soo Byun

Keyword(s):

Antireflection Coating ◽

Dual Damascene ◽

Damascene Process ◽

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Contextual DNA features significant for the DNA damage by the 193-nm ultraviolet laser beam

Doklady Biochemistry and Biophysics ◽

10.1134/s1607672912060038 ◽

2012 ◽

Vol 447 (1) ◽

pp. 267-272 ◽

Author(s):

N. N. Vtyurina ◽

S. L. Grohovsky ◽

A. B. Vasiliev ◽

I. I. Titov ◽

P. M. Ponomarenko ◽

...

Keyword(s):

Ultraviolet Laser ◽

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C–Br bond rupture in 193 nm photodissociation of vinyl bromide

Chemical Physics ◽

10.1016/s0301-0104(98)00085-8 ◽

1998 ◽

Vol 231 (2-3) ◽

pp. 345-353 ◽

Author(s):

Hideki Katayanagi ◽

Nobuaki Yonekuira ◽

Toshinori Suzuki

Keyword(s):

Bond Rupture ◽

Vinyl Bromide ◽

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Energy partitioning and spatial variability of air temperature, VPD and radiation in a greenhouse tunnel shaded by semitransparent organic PV modules

Solar Energy ◽

10.1016/j.solener.2021.03.050 ◽

2021 ◽

Vol 220 ◽

pp. 578-589

Author(s):

Maayan Friman-Peretz ◽

Shay Ozer ◽

Asher Levi ◽

Esther Magadley ◽

Ibrahim Yehia ◽

...

Keyword(s):

Spatial Variability ◽

Air Temperature ◽

Energy Partitioning ◽

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Advantages of using the 223-nm compared with 193-nm radiation wavelength for ophthalmic applications

10.1117/12.484494 ◽

2002 ◽

Author(s):

Sergei N. Bagayev ◽

Alexander M. Razhev ◽

Andrey A. Zhupikov ◽

Evgeny S. Kargapoltsev

Keyword(s):

Radiation Wavelength ◽

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