Real-Time Endpoint Detection of Small Exposed Area SiO2
Films in Plasma Etching Using Plasma Impedance Monitoring with Modified Principal Component Analysis
2013 ◽
Vol 10
(10)
◽
pp. 850-856
◽
Keyword(s):
2006 ◽
Vol 2006.55
(0)
◽
pp. 67-68
2003 ◽
Vol 132
(3)
◽
pp. 591-595
◽
Keyword(s):
Keyword(s):