Real-Time Endpoint Detection of Small Exposed Area SiO2 Films in Plasma Etching Using Plasma Impedance Monitoring with Modified Principal Component Analysis

2013 ◽  
Vol 10 (10) ◽  
pp. 850-856 ◽  
Author(s):  
Haegyu Jang ◽  
Jaewook Nam ◽  
Chang-Koo Kim ◽  
Heeyeop Chae
2019 ◽  
Vol 34 (1) ◽  
pp. 943-948 ◽  
Author(s):  
Min-Woo Kim ◽  
Seung-Gyun Kim ◽  
ShuKun Zhao ◽  
Sang Jeen Hong ◽  
Seung-Soo Han

2020 ◽  
Vol 1 (2) ◽  
pp. 1-36
Author(s):  
Ranak Roy Chowdhury ◽  
Muhammad Abdullah Adnan ◽  
Rajesh K. Gupta

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