1: Invited Paper: The Application of LTPS in Automotive Large Size Display

2021 ◽  
Vol 52 (S2) ◽  
pp. 1-3
Author(s):  
Li Jun
Keyword(s):  
Large Size ◽  
Size Display

P‐60: An 8Gbps Receiver for 8K Large‐Size Display

2019 ◽  
Vol 50 (1) ◽  
pp. 1460-1463
Author(s):  
Ju-Lin Huang ◽  
Yi-Chuan Liu ◽  
Ko-Chun Liang ◽  
Yu-Hsiang Wang ◽  
Che-Wei Yeh ◽  
...  
Keyword(s):  
Large Size ◽  
Size Display

An Addressable Controller for a Large Size Display Panel

1985 ◽  
Author(s):  
M. Melotte
Keyword(s):  
Large Size ◽  
Size Display

Colour appearance change of a large size display under various illumination conditions

2007 ◽  
Author(s):  
Seo Young Choi ◽  
Ming Ronnier Luo ◽  
Michael R. Pointer
Keyword(s):  
Large Size ◽  
Colour Appearance ◽  
Size Display

Large Size display with discharge tube

1998 ◽  
Vol 82 (Appendix) ◽  
pp. 319-319
Author(s):  
Junichi Nakajima
Keyword(s):  
Discharge Tube ◽  
Large Size ◽  
Size Display

scholarly journals Thermal Fringe Formation During a Hologram Recording Using a Dry Photopolymer

Photonics ◽  
2021 ◽  
Vol 8 (12) ◽  
pp. 589
Author(s):  
Friedrich-Karl Bruder ◽  
Thomas Fäcke ◽  
Thomas Rölle
Keyword(s):  
Coefficient Of Thermal Expansion ◽  
Hologram Recording ◽  
Optical Elements ◽  
Linear Coefficient ◽  
Large Size ◽  
Exposure Interval ◽  
Different Types ◽  
Recording Conditions ◽  
The One ◽  
Size Display

In this study we investigated the undesired but possible fringe formation during the recording of large size holographic optical elements (HOE) using a dry photopolymer. We identified the deformation of the recording element during hologram exposure as the main source for this fringe formation. This deformation is caused mainly by the one-sided heating of the recording element, namely, the dry photopolymer–recording plate stack. It turned out that the main source for this heating was the heat of polymerization in the dry photopolymer released during the exposure interval. These insights were translated into a physical model with which quantitative predictions about thermal fringe formation can be made depending on the actual HOE recording geometry, recording conditions and characteristics of the dry photopolymer. Using this model, different types of large size HOEs, used as components to generate a steerable confined view box for a 23” diagonal size display demonstrator, could be recorded successfully without thermal fringe formation. Key strategies to avoid thermal fringe formation deduced from this model include balancing the ratio of lateral recording plate dimension R to its thickness h, recording the power density P or equivalently the exposure time texp at a fixed recording dosage E, and most importantly recording the the linear coefficient of thermal expansion (CTE) of the recording plate material. Suitable glass plates with extremely low CTE were identified and used for recording of the above-mentioned HOEs.

scholarly journals Large size display with discharge tube

1996 ◽  
Vol 80 (Appendix) ◽  
pp. 333-334
Author(s):  
Junichi Nakajima
Keyword(s):  
Discharge Tube ◽  
Large Size ◽  
Size Display

41‐4: Preparation of High Performance Top‐Emission OLED for Large Size Display

2020 ◽  
Vol 51 (1) ◽  
pp. 599-602
Author(s):  
Chunjing Hu ◽  
Qing Dai ◽  
Juanjuan You ◽  
Ying Cui ◽  
Yue Zhang ◽  
...  
Keyword(s):  
High Performance ◽  
Large Size ◽  
Size Display

Coherency loss in γ' precipitates in nickel-base superalloy

1983 ◽  
Vol 41 ◽  
pp. 244-245
Author(s):  
R. A. Ricks ◽  
Angus J. Porter
Keyword(s):  
Lattice Mismatch ◽  
Lattice Parameter ◽  
Nickel Base Superalloy ◽  
Large Size ◽  
The Matrix ◽  
Nimonic 80A ◽  
Interfacial Dislocations ◽  
Nickel Base ◽  
Coherency Loss ◽  
Nimonic 115

During a recent investigation concerning the growth of γ' precipitates in nickel-base superalloys it was observed that the sign of the lattice mismatch between the coherent particles and the matrix (γ) was important in determining the ease with which matrix dislocations could be incorporated into the interface to relieve coherency strains. Thus alloys with a negative misfit (ie. the γ' lattice parameter was smaller than the matrix) could lose coherency easily and γ/γ' interfaces would exhibit regularly spaced networks of dislocations, as shown in figure 1 for the case of Nimonic 115 (misfit = -0.15%). In contrast, γ' particles in alloys with a positive misfit could grow to a large size and not show any such dislocation arrangements in the interface, thus indicating that coherency had not been lost. Figure 2 depicts a large γ' precipitate in Nimonic 80A (misfit = +0.32%) showing few interfacial dislocations.

Automatic analysis of Kikuchi diffraction patterns

1994 ◽  
Vol 52 ◽  
pp. 900-901
Author(s):  
H. Weiland ◽  
D. P. Field
Keyword(s):  
Electron Beam ◽  
Electron Microscope ◽  
Spatial Resolution ◽  
Relevant Information ◽  
Crystalline Materials ◽  
Large Size ◽  
Transmission Electron ◽  
New Type ◽  
Diffraction Patterns ◽  
Orientation Determination

Recent advances in the automatic indexing of backscatter Kikuchi diffraction patterns on the scanning electron microscope (SEM) has resulted in the development of a new type of microscopy. The ability to obtain statistically relevant information on the spatial distribution of crystallite orientations is giving rise to new insight into polycrystalline microstructures and their relation to materials properties. A limitation of the technique in the SEM is that the spatial resolution of the measurement is restricted by the relatively large size of the electron beam in relation to various microstructural features. Typically the spatial resolution in the SEM is limited to about half a micron or greater. Heavily worked structures exhibit microstructural features much finer than this and require resolution on the order of nanometers for accurate characterization. Transmission electron microscope (TEM) techniques offer sufficient resolution to investigate heavily worked crystalline materials.Crystal lattice orientation determination from Kikuchi diffraction patterns in the TEM (Figure 1) requires knowledge of the relative positions of at least three non-parallel Kikuchi line pairs in relation to the crystallite and the electron beam.

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