Monitoring Chemical Reactions in Metal-Organic Chemical Vapour Deposition (MOCVD)

1989 ◽  
pp. 131-143
Author(s):  
J. O. Williams ◽  
R. Hoare ◽  
N. Hunt ◽  
M. J. Parrott
Keyword(s):  
Chemical Reactions ◽  
Chemical Vapour Deposition ◽  
Vapour Deposition ◽  
Chemical Vapour ◽  
Organic Chemical ◽  
Metal Organic

scholarly journals Understanding metal organic chemical vapour deposition of monolayer WS2: the enhancing role of Au substrate for simple organosulfur precursors

Nanoscale ◽  
2020 ◽  
Vol 12 (43) ◽  
pp. 22234-22244
Author(s):  
Ye Fan ◽  
Kenichi Nakanishi ◽  
Vlad P. Veigang-Radulescu ◽  
Ryo Mizuta ◽  
J. Callum Stewart ◽  
...  
Keyword(s):  
Crystal Growth ◽  
Chemical Reactions ◽  
Chemical Vapour Deposition ◽  
Vapour Deposition ◽  
Chemical Vapour ◽  
Organic Chemical ◽  
Metal Organic ◽  
Ws2 Monolayer

A deconstructed MOCVD model process allows in-operando fingerprinting of the chemical reactions that underpin WS2 monolayer crystal growth, and highlights the enhancing role of Au support in conjunction with simple organosulfide precursors.

Vapour-pressure data for adducts of dimethylzinc: sources and dopants for zinc in metal–organic chemical vapour deposition

1993 ◽  
Vol 3 (7) ◽  
pp. 739-742 ◽  
Author(s):  
Paul O'Brien ◽  
John R. Walsh ◽  
Anthony C. Jones ◽  
Simon A. Rushworth ◽  
Clive Meaton
Keyword(s):  
Chemical Vapour Deposition ◽  
Vapour Pressure ◽  
Vapour Deposition ◽  
Chemical Vapour ◽  
Organic Chemical ◽  
Pressure Data ◽  
Metal Organic
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