Monte Carlo Simulations of Focused Ion Beam Induced Processing

Author(s):  
Rajendra Timilsina ◽  
Philip D. Rack
1988 ◽  
Vol 128 ◽  
Author(s):  
S. J. Pearton ◽  
K. T. Short ◽  
K. S. Jones ◽  
A. G. Baca ◽  
C. S. Wu

ABSTRACTThe systematics of ion beam induced intermixing of WSi0.45 on GaAs have been studied after through-implantation of Si or O in the dose range 1013 − 5 × 1016 cm−2. SIMS profiling shows significant knock-on of Si and W into the GaAs at the high dose range in accordance with Monte Carlo simulations, but there is virtually no electrical activation (≤0.1%) of this Si after normal implant annealing (900°C, 10 sec). This appears to be a result of the high level of disorder near the metal-semiconductor interface, which is not repaired by annealing. This damage consists primarily of dislocation loops extending a few hundred angstroms below the end of range of the implanted ions. Extrapolation of the ion doses used in this work to the usual doses used in GaAs device fabrication would imply that ion-induced intermixing of WSix will not be significant in through-implantation processes.


2021 ◽  
Author(s):  
Shota Abe ◽  
Charles Skinner ◽  
Igor Bykov ◽  
Yao-Wen Yeh ◽  
Ane Lasa ◽  
...  

Abstract The magnetic pre-sheath (MPS) width, L MPS, is a critical parameter to define the sheath potential, which controls the ion trajectory of low-Z species (D, T, He, and C), as well as the prompt re-deposition of high-Z species. To determine L MPS, we fabricated micro-trenches (30×30×4 µm) via focused ion beam (FIB) milling on a silicon surface and exposed them to L-mode deuterium plasmas in DIII-D via the Divertor Material Evaluation System (DiMES) removable sample exposure probe. The areal distribution of impurity depositions, mainly consisting of carbon, was measured by energy-dispersive X-ray spectroscopy (EDS) to reveal the deuterium ion shadowing effect on the trench floors. The carbon deposition profiles showed that the erosion was maximized for the azimuthal direction of φ = -40° (referenced to the toroidal magnetic field direction) as well as the polar angle of θ = 80°. A Monte Carlo equation-of-motion model, based on a collisionless MPS, was used to calculate the azimuthal and polar deuterium ion angle distributions (IADs) for a range of L MPS = k × ρ i, where ρ i is the ion gyro radius and k = 0.5-4. Then, gross erosion profiles were calculated by a Monte Carlo micro-patterning and roughness (MPR) code for ion sputtering using as input the calculated azimuthal and polar IADs for each value of k. Good agreement with the experimental C deposition profiles was obtained for the case k = 2.5-3.5. This result is consistent with a previous kinetic modeling prediction of k ~ 3, as well as previous analytical investigations that predicted the L MPS to be several ion gyro radii. A validation of theoretical sheath models supports its applicability to ITER and pilot plant divertors to successfully predict plasma-materials interactions.


2010 ◽  
Vol 87 (5-8) ◽  
pp. 1597-1599 ◽  
Author(s):  
D. Kunder ◽  
E. Baer ◽  
M. Sekowski ◽  
P. Pichler ◽  
M. Rommel

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