Explosive Decomposition of Tetramethyldioxetane in the Solid Phase: Potential for a High Density Short Wavelength Chemical Laser

Author(s):  
M. A. Tolbert ◽  
M. N. Spencer ◽  
D. L. Huestis ◽  
M. J. Rossi
1988 ◽  
Vol 42 (1) ◽  
pp. 73-85 ◽  
Author(s):  
M.A. Tolbert ◽  
M.N. Spencer ◽  
D.L. Huestis ◽  
M.J. Rossi

2001 ◽  
Vol 72 (1) ◽  
pp. 1094-1097 ◽  
Author(s):  
S. Okajima ◽  
K. Nakayama ◽  
H. Tazawa ◽  
K. Kawahata ◽  
K. Tanaka ◽  
...  

2010 ◽  
Vol 22 (1) ◽  
pp. 171-175 ◽  
Author(s):  
周身林 Zhou Shenlin ◽  
张久兴 Zhang Jiuxing ◽  
刘丹敏 Liu Danmin

1986 ◽  
Vol 28 (11) ◽  
pp. 2668-2674
Author(s):  
A.N. Kryuchkov ◽  
O.V. Shatalova ◽  
E.V. Prut ◽  
L.L. Razumova ◽  
D.P. Shashkin ◽  
...  

Wear ◽  
1973 ◽  
Vol 24 (1) ◽  
pp. 35-51 ◽  
Author(s):  
B.B. Seedhom ◽  
D. Dowson ◽  
V. Wright

2014 ◽  
Vol 92 (7/8) ◽  
pp. 576-581 ◽  
Author(s):  
Mikuri Kanai ◽  
Yuji Kojima ◽  
Masao Isomura

We have investigated the preparation of crystalline germanium films by the solid phase crystallization (SPC) of amorphous germanium (a-Ge) precursor on single crystalline silicon substrates. The a-Ge precursor easily incorporates the impurities from the surface exposed to the air, and the impurities affect the crystallinity after the SPC. In the a-Ge precursor prepared by Knudsen-cell evaporation, the preferential crystalline growth following the Si substrates is disturbed by the high density of impurities and the random crystalline structures are formed. The a-Ge precursors prepared by electron beam evaporation have high impurity concentrations only near the surface because the impurity diffusion is slow because of the relatively high density. The preferential growth is successfully obtained in a-Ge precursor prepared on n-type Si substrates, although the random crystallization is slightly observed on p-type Si substrates. By sufficiently reducing the impurity concentrations by avoiding the air exposure, the preferential growth can be promoted on p-type Si substrates. The impurity incorporation because of the air exposure is sufficiently reduced for the preferential growth by covering a-Ge with a-Si blocking layers. This method is effective for future practical applications of SPC Ge films.


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