In Situ X-Ray Reciprocal Space Mapping for Characterization of Nanomaterials

Author(s):  
Peter Siffalovic ◽  
Karol Vegso ◽  
Martin Hodas ◽  
Matej Jergel ◽  
Yuriy Halahovets ◽  
...  
2007 ◽  
Vol 40 (2) ◽  
pp. 332-337 ◽  
Author(s):  
R. Guinebretière ◽  
A. Boulle ◽  
R. Bachelet ◽  
O. Masson ◽  
P. Thomas

A laboratory X-ray diffractometer devoted to thein situcharacterization of the microstructure of epitaxic thin films at temperatures up to 1500 K has been developed. The sample holder was built using refractory materials, and a high-accuracy translation stage allows correction of the dilatation of both the sample and the sample holder. The samples are oriented with respect to the primary beam with two orthogonal rotations allowing the registration of symmetric as well as asymmetric reciprocal space maps (RSMs). The association of a monochromatic primary beam and a position-sensitive detector allows the measurement of RSMs in a few minutes for single crystals and in a few hours for imperfect epitaxic thin films. A detailed description of the setup is given and its potential is illustrated by high-temperature RSM experiments performed on yttria-doped zirconia epitaxic thin films grown on sapphire substrates.


CrystEngComm ◽  
2017 ◽  
Vol 19 (22) ◽  
pp. 2977-2982 ◽  
Author(s):  
H. V. Stanchu ◽  
A. V. Kuchuk ◽  
M. Barchuk ◽  
Yu. I. Mazur ◽  
V. P. Kladko ◽  
...  

1993 ◽  
Vol 49 (s1) ◽  
pp. c369-c370
Author(s):  
G. T. Baumbach ◽  
M. Gailhanou ◽  
U. Marti ◽  
P. Silva ◽  
M. Bessiere ◽  
...  

2014 ◽  
Vol 118 (13) ◽  
pp. 7195-7201 ◽  
Author(s):  
Peter Siffalovic ◽  
Karol Vegso ◽  
Monika Benkovicova ◽  
Matej Jergel ◽  
Andrej Vojtko ◽  
...  

2015 ◽  
Vol 425 ◽  
pp. 13-15 ◽  
Author(s):  
Takuo Sasaki ◽  
Masamitu Takahasi ◽  
Hidetoshi Suzuki ◽  
Yoshio Ohshita ◽  
Masafumi Yamaguchi

2010 ◽  
Vol 1268 ◽  
Author(s):  
Takuo Sasaki ◽  
Hidetoshi Suzuki ◽  
Akihisa Sai ◽  
Masamitu Takahasi ◽  
Seiji Fujikawa ◽  
...  

AbstractThe in situ X-ray reciprocal space mapping (in situ RSM) of symmetric diffraction measurements during lattice-mismatched InGaAs/GaAs(001) growth were performed to investigate the strain relaxation mechanisms. The evolution of the residual strain and crystal quality were obtained as a function of InGaAs film thickness. Based on the results, the correlation between the strain relaxation and the dislocations during the film growth were evaluated. As a result, film thickness ranges with different relaxation mechanisms were classified, and dominant dislocation behavior in each phase were deduced. From the data obtained in in situ measurements, the quantitative strain relaxation models were proposed based on a dislocation kinetic model developed by Dodson and Tsao. Good agreement between the in situ data and the model ensured the validity of the dominant dislocation behavior deduced from the present study.


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