A unified global self-consistent model of a capacitively and inductively coupled plasma etching system

2000 ◽  
Vol 17 (3) ◽  
pp. 304-309 ◽  
Author(s):  
Yoon-Bong Hahn ◽  
Stephen J. Pearton
Keyword(s):  
Plasma Etching ◽  
Inductively Coupled Plasma ◽  
Inductively Coupled Plasma Etching ◽  
Inductively Coupled ◽  
Consistent Model ◽  
Self Consistent ◽  
Etching System

Etching of CoFeB Using CO∕NH[sub 3] in an Inductively Coupled Plasma Etching System

2011 ◽  
Vol 158 (1) ◽  
pp. H1 ◽  
Author(s):  
Jong-Yoon Park ◽  
Se-Koo Kang ◽  
Min-Hwan Jeon ◽  
Myung S. Jhon ◽  
Geun-Young Yeom
Keyword(s):  
Plasma Etching ◽  
Inductively Coupled Plasma ◽  
Inductively Coupled Plasma Etching ◽  
Inductively Coupled ◽  
Etching System

Inductively coupled plasma etching for delineation of InAs/GaSb pixels

2012 ◽  
Author(s):  
Jean Nguyen ◽  
John Gill ◽  
Sir B. Rafol ◽  
Alexander Soibel ◽  
Arezou Khoshakhlagh ◽  
...  
Keyword(s):  
Plasma Etching ◽  
Inductively Coupled Plasma ◽  
Inductively Coupled Plasma Etching ◽  
Inductively Coupled

Inductively coupled plasma etching of HgCdTe using a CH4-based mixture

2005 ◽  
Vol 34 (6) ◽  
pp. 740-745 ◽  
Author(s):  
E. Laffosse ◽  
J. Baylet ◽  
J. P. Chamonal ◽  
G. Destefanis ◽  
G. Cartry ◽  
...  
Keyword(s):  
Plasma Etching ◽  
Inductively Coupled Plasma ◽  
Inductively Coupled Plasma Etching ◽  
Inductively Coupled

Optimized inductively coupled plasma etching for poly(methyl-methacrylate-glycidly-methacrylate) optical waveguide

2012 ◽  
Vol 520 (18) ◽  
pp. 5946-5951 ◽  
Author(s):  
Xiaoqiang Sun ◽  
Xiaodong Li ◽  
Changming Chen ◽  
Kun Zhang ◽  
Jie Meng ◽  
...  
Keyword(s):  
Methyl Methacrylate ◽  
Optical Waveguide ◽  
Plasma Etching ◽  
Inductively Coupled Plasma ◽  
Poly Methyl Methacrylate ◽  
Inductively Coupled Plasma Etching ◽  
Inductively Coupled

Low resistivity contacts to plasma etched Mg-doped GaN using very low power inductively coupled plasma etching

2011 ◽  
Vol 519 (11) ◽  
pp. 3686-3689 ◽  
Author(s):  
A. Baharin ◽  
R.S. Pinto ◽  
U.K. Mishra ◽  
B.D. Nener ◽  
G. Parish
Keyword(s):  
Low Power ◽  
Plasma Etching ◽  
Inductively Coupled Plasma ◽  
Inductively Coupled Plasma Etching ◽  
Low Resistivity ◽  
Inductively Coupled ◽  
Mg Doped

Fabrication of GaN nanorods by inductively coupled plasma etching via SiO2 nanosphere lithography

2009 ◽  
Vol 517 (14) ◽  
pp. 3859-3861 ◽  
Author(s):  
Byung-Jae Kim ◽  
Hyunjung Jung ◽  
Hong-Yeol Kim ◽  
Joona Bang ◽  
Jihyun Kim
Keyword(s):  
Plasma Etching ◽  
Inductively Coupled Plasma ◽  
Nanosphere Lithography ◽  
Inductively Coupled Plasma Etching ◽  
Inductively Coupled

Factors Affecting the Top Stripping of GaAs Microwire Array Fabricated by Inductively Coupled Plasma Etching

2015 ◽  
Vol 32 (5) ◽  
pp. 058102 ◽  
Author(s):  
Ying Cheng ◽  
Ji-Jun Zou ◽  
Ming Wan ◽  
Wei-Lu Wang ◽  
Xin-Cun Peng ◽  
...  
Keyword(s):  
Plasma Etching ◽  
Inductively Coupled Plasma ◽  
Factors Affecting ◽  
Inductively Coupled Plasma Etching ◽  
Inductively Coupled

Effect of additive noble gases in chlorine-based inductively coupled plasma etching of GaN, InN, and AlN

1999 ◽  
Vol 17 (3) ◽  
pp. 768-773 ◽  
Author(s):  
Y. B. Hahn ◽  
D. C. Hays ◽  
S. M. Donovan ◽  
C. R. Abernathy ◽  
J. Han ◽  
...  
Keyword(s):  
Plasma Etching ◽  
Inductively Coupled Plasma ◽  
Noble Gases ◽  
Inductively Coupled Plasma Etching ◽  
Inductively Coupled
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