Manufacture of Binary Nanofeatured Polymeric Films Using Nanosphere Lithography and Ultraviolet Roller Imprinting

This paper describes the manufacture of binary nanostructured films utilizing nanosphere lithography and ultraviolet (UV) roller imprinting. To manufacture the binary nanofeatured template, polystyrene nanocolloids of two distinct dimensions (900 and 300 nm) were primarily self-assembly spun coated on a silicon substrate. A roller imprinting facility equipped with polydimethylsiloxane molds and ultraviolet radiation was employed. During the imprinting procedure, the roller was steered by a motor and compressed the ultraviolet-curable polymeric layer against the glass substrate, where the nanofeatured layer was cured by the UV light source. Binary nanofeatured films were thus obtained. The influence of distinct processing variables on the imprinting of nanofeatured films was investigated. The empirical data suggested that with appropriate processing conditions, binary nanofeatured plastic films can be satisfactorily manufactured. It also demonstrated that roller imprinting combined with ultraviolet radiation can offer an easy yet effective method to prepare binary nanofeatured films, with a miniatured processing time and enhanced part quality.

Plasmonically enhanced photoluminescence of monolayer MoS2 via nanosphere lithography-templated gold metasurfaces

We demonstrate a simple, cost-effective method to enhance the photoluminescence intensity of monolayer MoS2. A hexagonal symmetric Au metasurface, made by polystyrene nanosphere lithography and metal coating, is developed to enhance the photoluminescence intensity of monolayer MoS2. By using nanospheres of different sizes, the localized surface plasmon resonances of the Au metasurfaces can be effectively tuned. By transferring monolayer MoS2 onto the Au metasurface, the photoluminescence signal of the monolayer MoS2 can be significantly enhanced up to 12-fold over a square-centimeter area. The simple, large-area, cost-effective fabrication technique could pave a new way for plasmon-enhanced light-mater interactions of atomically thin two-dimensional materials.

High-yield fabrication of perpendicularly magnetised synthetic antiferromagnetic nanodiscs

Synthetic antiferromagnetic (SAF) particles with perpendicular anisotropy display a number of desirable characteristics for applications in biological and other fluid environments. We present an efficient and effective method for the patterning of ultrathin Ruderman-Kittel-Kasuya-Yoshida coupled, perpendicularly magnetised SAFs using a combination of nanosphere lithography and ion milling. A Ge sacrificial layer is utilised, which provides a clean and simple lift-off process, as well as maintaining the key magnetic properties that are beneficial to target applications. We demonstrate that the method is capable of producing a particularly high yield of well-defined, thin film based nanoparticles.