Inductively coupled plasma etching of SiC in SF6/O2 and etch-induced surface chemical bonding modifications
2003 ◽
Vol 93
(3)
◽
pp. 1376-1383
◽
Liudi Jiang
◽
R. Cheung
◽
R. Brown
◽
A. Mount
Jean Nguyen
◽
John Gill
◽
Sir B. Rafol
◽
Alexander Soibel
◽
Arezou Khoshakhlagh
◽
...
2005 ◽
Vol 34
(6)
◽
pp. 740-745
◽
E. Laffosse
◽
J. Baylet
◽
J. P. Chamonal
◽
G. Destefanis
◽
G. Cartry
◽
...
2012 ◽
Vol 520
(18)
◽
pp. 5946-5951
◽
Xiaoqiang Sun
◽
Xiaodong Li
◽
Changming Chen
◽
Kun Zhang
◽
Jie Meng
◽
...
2011 ◽
Vol 519
(11)
◽
pp. 3686-3689
◽
A. Baharin
◽
R.S. Pinto
◽
U.K. Mishra
◽
B.D. Nener
◽
G. Parish
2009 ◽
Vol 517
(14)
◽
pp. 3859-3861
◽
Byung-Jae Kim
◽
Hyunjung Jung
◽
Hong-Yeol Kim
◽
Joona Bang
◽
Jihyun Kim
2015 ◽
Vol 32
(5)
◽
pp. 058102
◽
Ying Cheng
◽
Ji-Jun Zou
◽
Ming Wan
◽
Wei-Lu Wang
◽
Xin-Cun Peng
◽
...
1999 ◽
Vol 17
(3)
◽
pp. 768-773
◽
Y. B. Hahn
◽
D. C. Hays
◽
S. M. Donovan
◽
C. R. Abernathy
◽
J. Han
◽
...
2011 ◽
Vol 50
(6)
◽
pp. 06GG07
◽
Akihiro Matsutani
◽
Hideo Ohtsuki
◽
Fumio Koyama
2008 ◽
Vol 93
(13)
◽
pp. 131913
◽
M. Avella
◽
J. Jiménez
◽
F. Pommereau
◽
J. P. Landesman
◽
A. Rhallabi
2010 ◽
Vol 46
(01)
◽
pp. 182
◽