scholarly journals Bottom-induced contributions to Higgs plus jet at next-to-next-to-leading order

2021 ◽  
Vol 2021 (5) ◽  
Author(s):  
Roberto Mondini ◽  
Ciaran Williams

Abstract We present a next-to-next-to-leading order (NNLO) QCD calculation of the bottom-induced contributions to the production of a Higgs boson plus a jet, i.e. the process pp → H + j to $$ \mathcal{O}\left({y}_b^2{\alpha}_s^3\right) $$ O y b 2 α s 3 . We work in the five-flavor scheme (5FS) in which the bottom quark mass is retained only in the coupling to the Higgs boson. Our calculation uses N-jettiness slicing to regulate infrared divergences, allowing for fully-differential predictions for collider observables. After extensively validating the methodology, we present results for the 13 TeV LHC. Our NNLO predictions show a marked improvement in the overall renormalization and factorization scale dependence, the latter of which proves to be particularly troublesome for 5FS calculations at lower orders. In addition, using the same methodology we present a NNLO computation of $$ b\overline{b} $$ b b ¯ → H. Our results are implemented into MCFM.


2021 ◽  
Vol 2021 (4) ◽  
Author(s):  
Marco Niggetiedt

Abstract We follow up on our discussion of the exact quark-mass dependence of the Higgs-gluon form factor at three loops in QCD [1] and turn our attention to the closely related Higgs-photon form factor. Similarly to our previous work, we intend to examine the form factor for the decay of a Higgs-boson with variable mass into two photons at the three-loop level in QCD. The set of master integrals is known numerically due to prior work on the Higgs-gluon form factor and is exploited to obtain expansions around the threshold as well as in the high-energy limit. Our results may be utilised to derive the photonic decay rate of the Higgs-boson through next-to-next-to-leading order.



1999 ◽  
Vol 471 (2-3) ◽  
pp. 233-243 ◽  
Author(s):  
M. Beneke ◽  
A. Signer










2022 ◽  
Vol 2022 (1) ◽  
Author(s):  
Joshua Davies ◽  
Florian Herren ◽  
Go Mishima ◽  
Matthias Steinhauser

Abstract In this paper we consider the next-to-next-to-leading order total cross section of Higgs boson pair production in the large top quark mass limit and compute four expansion terms in 1/$$ {m}_t^2 $$ m t 2 . To this end, we analytically compute the real-virtual and double-real contributions to the total cross section and combine them with the existing virtual contribution. Good convergence is observed below the top quark threshold, which makes our results a valuable input for approximation methods which aim for next-to-next-to-leading order corrections over the whole kinematic range. We present details on various steps of our calculation; in particular, we provide results for three- and four-particle phase-space master integrals and describe in detail the evaluation of the collinear counterterms.



2005 ◽  
Vol 724 (1-2) ◽  
pp. 197-246 ◽  
Author(s):  
Charalampos Anastasiou ◽  
Kirill Melnikov ◽  
Frank Petriello


2021 ◽  
Vol 2021 (3) ◽  
Author(s):  
Stefano Catani ◽  
Simone Devoto ◽  
Massimiliano Grazzini ◽  
Stefan Kallweit ◽  
Javier Mazzitelli

Abstract We report on the first fully differential calculation of the next-to-next-to-leading-order (NNLO) QCD radiative corrections to the production of bottom-quark pairs at hadron colliders. The calculation is performed by using the qT subtraction formalism to handle and cancel infrared singularities in real and virtual contributions. The computation is implemented in the Matrix framework, thereby allowing us to efficiently compute arbitrary infrared-safe observables in the four-flavour scheme. We present selected predictions for bottom-quark production at the Tevatron and at the LHC at different collider energies, and we perform some comparisons with available experimental results. We find that the NNLO corrections are sizeable, typically of the order of 25–35%, and they lead to a significant reduction of the perturbative uncertainties. Therefore, their inclusion is crucial for an accurate theoretical description of this process.



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