Simultaneous measurement of surface shape and absolute optical thickness of a glass plate by wavelength tuning phase-shifting interferometry

2012 ◽  
Vol 19 (4) ◽  
pp. 247-253 ◽  
Author(s):  
Kenichi Hibino ◽  
Yangjin Kim ◽  
Sangyu Lee ◽  
Yohan Kondo ◽  
Naohiko Sugita ◽  
...  
Keyword(s):  
Optical Thickness ◽  
Simultaneous Measurement ◽  
Glass Plate ◽  
Phase Shifting ◽  
Wavelength Tuning ◽  
Surface Shape ◽  
Phase Shifting Interferometry

scholarly journals Simultaneous measurement of surface shape and optical thickness using wavelength tuning and a polynomial window function

2015 ◽  
Vol 23 (25) ◽  
pp. 32869 ◽  
Author(s):  
Yangjin Kim ◽  
Kenichi Hibino ◽  
Naohiko Sugita ◽  
Mamoru Mitsuishi
Keyword(s):  
Optical Thickness ◽  
Simultaneous Measurement ◽  
Wavelength Tuning ◽  
Surface Shape ◽  
Window Function

Determination of Phase Shift by Digital Holography

2019 ◽  
Vol 888 ◽  
pp. 43-46
Author(s):  
Yoshitaka Takahashi ◽  
Masatoshi Saito ◽  
Toru Nakajima ◽  
Masakazu Shingu
Keyword(s):  
Phase Shift ◽  
Noise Reduction ◽  
Digital Holography ◽  
High Accuracy ◽  
Measured Data ◽  
Phase Shifting ◽  
Surface Shape ◽  
Shape Measurement ◽  
Phase Shifting Interferometry

In phase shifting interferometry phase shift is applied by various ways, but applying it with high accuracy, especially by LD current modulation, is not easy. In order to determine the accurate phase shift a new method has been proposed that the value of LD current corresponding to π/2 phase shift can be determined by phase shifting digital holography. The measured data of standard in surface shape measurement were used for calibration, and the obtained value was confirmed to cause noise reduction and improvement of holographic reconstructed images in digital holography.

Simultaneous measurement of the surface shape and thickness for an optical flat with a wavelength-tuning Fizeau interferometer with suppression of drift error

2020 ◽  
Vol 59 (4) ◽  
pp. 991
Author(s):  
Yangjin Kim ◽  
Younghoon Moon ◽  
Kenichi Hibino ◽  
Naohiko Sugita ◽  
Mamoru Mitsuishi
Keyword(s):  
Simultaneous Measurement ◽  
Wavelength Tuning ◽  
Surface Shape ◽  
Fizeau Interferometer

scholarly journals Precise Measurement of the Surface Shape of Silicon Wafer by Using a New Phase-Shifting Algorithm and Wavelength-Tuning Interferometer

2020 ◽  
Vol 10 (9) ◽  
pp. 3250
Author(s):  
Fuqing Miao ◽  
Seokyoung Ahn ◽  
Yangjin Kim
Keyword(s):  
Silicon Wafer ◽  
Phase Error ◽  
Surface Profile ◽  
Phase Shifting ◽  
Wavelength Tuning ◽  
Surface Shape ◽  
Window Function ◽  
Phase Shift Error ◽  
Coupling Error ◽  
New Phase

In wavelength-tuning interferometry, the surface profile of the optical component is a key evaluation index. However, the systematic errors caused by the coupling error between the higher harmonics and phase shift error are considerable. In this research, a new 10N − 9 phase-shifting algorithm comprising a new polynomial window function and a DFT is developed. A new polynomial window function is developed based on characteristic polynomial theory. The characteristic of the new 10N − 9 algorithm is represented in the frequency domain by Fourier description. The phase error of the new algorithm is also discussed and compared with other phase-shifting algorithms. The surface profile of a silicon wafer was measured by using the 10N − 9 algorithm and a wavelength-tuning interferometer. The repeatability measurement error across 20 experiments was 2.045 nm, which indicates that the new 10N − 9 algorithm outperforms the conventional phase-shifting algorithm.

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