scholarly journals Effects of impurities on the lattice dynamics of nanocrystalline silicon for thermoelectric application

2012 ◽  
Vol 48 (7) ◽  
pp. 2836-2845 ◽  
Author(s):  
Tania Claudio ◽  
Gabi Schierning ◽  
Ralf Theissmann ◽  
Hartmut Wiggers ◽  
Helmut Schober ◽  
...  
2015 ◽  
Vol 213 (3) ◽  
pp. 515-523 ◽  
Author(s):  
Tania Claudio ◽  
Niklas Stein ◽  
Nils Petermann ◽  
Daniel G. Stroppa ◽  
Michael Marek Koza ◽  
...  

2014 ◽  
Vol 16 (47) ◽  
pp. 25701-25709 ◽  
Author(s):  
Tania Claudio ◽  
Niklas Stein ◽  
Daniel G. Stroppa ◽  
Benedikt Klobes ◽  
Michael Marek Koza ◽  
...  

2003 ◽  
Vol 112 ◽  
pp. 407-410
Author(s):  
S. A. Danilkin ◽  
M. Hölzel ◽  
H. Fuess ◽  
H. Wipf ◽  
T. J. Udovic ◽  
...  

1974 ◽  
Vol 35 (C6) ◽  
pp. C6-375-C6-377
Author(s):  
W. MÜLLER ◽  
H. WINKLER ◽  
E. GERDAU
Keyword(s):  

1981 ◽  
Vol 42 (C6) ◽  
pp. C6-599-C6-601 ◽  
Author(s):  
T. Wasiutynski ◽  
I. Natkaniec ◽  
A. I. Belushkin

2020 ◽  
Vol 65 (3) ◽  
pp. 236
Author(s):  
R. M. Rudenko ◽  
O. O. Voitsihovska ◽  
V. V. Voitovych ◽  
M. M. Kras’ko ◽  
A. G. Kolosyuk ◽  
...  

The process of crystalline silicon phase formation in tin-doped amorphous silicon (a-SiSn) films has been studied. The inclusions of metallic tin are shown to play a key role in the crystallization of researched a-SiSn specimens with Sn contents of 1–10 at% at temperatures of 300–500 ∘C. The crystallization process can conditionally be divided into two stages. At the first stage, the formation of metallic tin inclusions occurs in the bulk of as-precipitated films owing to the diffusion of tin atoms in the amorphous silicon matrix. At the second stage, the formation of the nanocrystalline phase of silicon occurs as a result of the motion of silicon atoms from the amorphous phase to the crystalline one through the formed metallic tin inclusions. The presence of the latter ensures the formation of silicon crystallites at a much lower temperature than the solid-phase recrystallization temperature (about 750 ∘C). A possibility for a relation to exist between the sizes of growing silicon nanocrystallites and metallic tin inclusions favoring the formation of nanocrystallites has been analyzed.


1998 ◽  
Vol 536 ◽  
Author(s):  
A. B. Pevtsov ◽  
N. A. Feoktistov ◽  
V. G. Golubev

AbstractThin (<1000 Å) hydrogenated nanocrystalline silicon films are widely used in solar cells, light emitting diodes, and spatial light modulators. In this work the conductivity of doped and undoped amorphous-nanocrystalline silicon thin films is studied as a function of film thickness: a giant anisotropy of conductivity is established. The longitudinal conductivity decreases dramatically (by a factor of 109 − 1010) as the layer thickness is reduced from 1500 Å to 200 Å, while the transverse conductivity remains close to that of a doped a- Si:H. The data obtained are interpreted in terms of the percolation theory.


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