Impact of nitrogen reactive gas and substrate temperature on the optical, electrical and structural properties of sputtered TiN thin films

2020 ◽  
Vol 31 (22) ◽  
pp. 20009-20021
Author(s):  
N. Mustapha ◽  
Z. Fekkai
Vacuum ◽  
2012 ◽  
Vol 86 (12) ◽  
pp. 1920-1923 ◽  
Author(s):  
Murad Ali Khaskheli ◽  
Ping Wu ◽  
Xianfei Li ◽  
Hui Wang ◽  
Shiping Zhang ◽  
...  

1998 ◽  
Vol 541 ◽  
Author(s):  
J. A. Díaz ◽  
M. P. Cruz ◽  
O. E. Contreras ◽  
J. M. Siqueiros ◽  
J. Portelles

AbstractA systematic study is presented of the resulting SBT films deposited by PLD at substrate temperatures from 300 to 600°C. The characteristics of the film as-deposited are determined. Special attention is focused on the compositional and structural properties. XRD, SEM, and TEM analyses are reported.


2002 ◽  
Vol 91 (11) ◽  
pp. 9401-9407 ◽  
Author(s):  
Chandan Das ◽  
Arup Dasgupta ◽  
S. C. Saha ◽  
Swati Ray

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