The Effect of the Shape of the Anode Head on the Nitrogen Soft X-Ray Emission from a Dense Plasma Focus Device: a Numerical Investigation Using the Modified Lee Model Code Accompanied by Experiments

2018 ◽  
Vol 38 (2) ◽  
pp. 205-212 ◽  
Author(s):  
Hadi Barati ◽  
Morteza Habibi
Keyword(s):  
Numerical Investigation ◽  
Plasma Focus ◽  
Dense Plasma ◽  
Plasma Focus Device ◽  
Dense Plasma Focus ◽  
Lee Model Code ◽  
Lee Model ◽  
X Ray ◽  
Model Code

scholarly journals Introduction to Numerical Experiment on Plasma Focus using Lee Model Code

2015 ◽  
Vol 5 ◽  
pp. 137-141
Author(s):  
P. Gautam ◽  
R. Khanal
Keyword(s):  
Computer Simulation ◽  
Plasma Focus ◽  
Dense Plasma ◽  
Electrical Circuit ◽  
Dense Plasma Focus ◽  
Lee Model Code ◽  
Lee Model ◽  
Model Code ◽  
Hot Plasma ◽  
Simulation Package

A dense plasma focus is table top machine producing short-lived very hot plasma and can cause nuclear fusion. Lee Model Code is a computer simulation package, which was successfully used in Mather and Fillipov type plasma focus. Lee Model couples the electrical circuit with the plasma focus dynamics, radiation and thermodynamics to simplify the complicated dynamics of plasma focus. This package enables us to simulate and analyze all of the gross properties. In this paper we present the importance of current fitting and the relation of it with other plasma focus parameter and overview of Lee Model Code together with physical basis, scope and the results obtained from the Lee Model Code. The Himalayan Physics Year 5, Vol. 5, Kartik 2071 (Nov 2014)Page: 137-141

The effects of pre-ionization on the impurity and x-ray level in a dense plasma focus device

2017 ◽  
Vol 24 (2) ◽  
pp. 022509 ◽  
Author(s):  
D. Piriaei ◽  
H. R. Yousefi ◽  
T. D. Mahabadi ◽  
A. Salar Elahi ◽  
M. Ghoranneviss
Keyword(s):  
Plasma Focus ◽  
Dense Plasma ◽  
Plasma Focus Device ◽  
Dense Plasma Focus ◽  
X Ray

Current sheath dynamics and X-ray emission studies from sequential dense plasma focus device

2000 ◽  
Vol 28 (4) ◽  
pp. 1263-1270 ◽  
Author(s):  
R. Gupta ◽  
S.R. Mohanty ◽  
R.S. Rawat ◽  
M.P. Srivastava
Keyword(s):  
Plasma Focus ◽  
Dense Plasma ◽  
Plasma Focus Device ◽  
Dense Plasma Focus ◽  
Current Sheath ◽  
X Ray ◽  
Emission Studies

scholarly journals Neutron anisotropy and X-ray production of the FN-II dense plasma focus device

2002 ◽  
Vol 32 (1) ◽  
Author(s):  
F. Castillo ◽  
J.J.E. Herrera ◽  
J. Rangel ◽  
A. Alfaro ◽  
M.A. Maza ◽  
...  
Keyword(s):  
Plasma Focus ◽  
Dense Plasma ◽  
Plasma Focus Device ◽  
Dense Plasma Focus ◽  
X Ray

scholarly journals Optimization of neon soft X-ray yield in a low-energy dense plasma focus device

2019 ◽  
Vol 33 (07) ◽  
pp. 1950077 ◽  
Author(s):  
M. A. Malek ◽  
M. K. Islam ◽  
M. Akel ◽  
M. Salahuddin ◽  
S. H. Saw ◽  
...  
Keyword(s):  
Plasma Focus ◽  
Numerical Experiments ◽  
Dense Plasma ◽  
Optimum Combination ◽  
Theoretical Physics ◽  
Lee Model Code ◽  
X Ray ◽  
Model Code ◽  
Yield Formula ◽  
Optimum Formula

The modified version of Lee model code is used in numerical experiments for characterizing and optimizing neon soft X-ray yield ([Formula: see text]) of the United Nations University/International Center for Theoretical Physics Plasma Focus Facility (UNU/ICTP PFF) device operated at 14 kV and 30 [Formula: see text]. In our present work, the neon yield [Formula: see text] is improved with an optimized UNU/ICTP PFF device by computing the optimum combination of static inductance ([Formula: see text]), anode length ([Formula: see text]), anode radius ([Formula: see text]) and cathode radius ([Formula: see text]), keeping fixed their ratio ([Formula: see text]) at 3.368, through a lot of numerical experiments at six operating pressures ([Formula: see text]). At lower [Formula: see text] (e.g. 2.0, 2.5 and 3.3 Torr), the optimum [Formula: see text] value, together with the corresponding optimum combination of [Formula: see text], [Formula: see text] and [Formula: see text], is found to be 15 nH, whereas at higher [Formula: see text] (e.g. 4.0, 5.0 and 6.0 Torr), it is obtained as 10 nH. Though the computed maximum neon yield [Formula: see text] (57.2 J with the corresponding efficiency of 1.94%) is found at [Formula: see text], assuming an achievable range of incorporating low-inductance technology, the best optimum combination of [Formula: see text], [Formula: see text], [Formula: see text] and [Formula: see text] is found to be at [Formula: see text], resulting in the computed optimum neon yield [Formula: see text] of 54.60 J with a corresponding efficiency of 1.9%. This computed neon yield [Formula: see text] is about 11 times higher than the measured value [Formula: see text] at optimum [Formula: see text] of UNU/ICTP PFF. It is also observed that our computed neon yield [Formula: see text] is improved by around six times from the previously computed value, which was 9.5 J at the optimum [Formula: see text] Torr for optimum anode configuration of this machine. In addition, neon yield [Formula: see text] is obtained with our optimized combination of [Formula: see text], [Formula: see text], [Formula: see text] and [Formula: see text] at 11.5 kV and compared with the measured neon yield [Formula: see text] of the NX2 machine.

Optimization of neon soft X-rays emission from 200 J fast miniature dense plasma focus device: A potential source for soft X-ray lithography

2013 ◽  
Vol 377 (18) ◽  
pp. 1290-1296 ◽  
Author(s):  
S.M.P. Kalaiselvi ◽  
T.L. Tan ◽  
A. Talebitaher ◽  
P. Lee ◽  
R.S. Rawat
Keyword(s):  
Plasma Focus ◽  
Dense Plasma ◽  
Plasma Focus Device ◽  
Dense Plasma Focus ◽  
X Rays ◽  
X Ray ◽  
Potential Source
Sign in / Sign up

Export Citation Format

Share Document