Galvanostatic synthesis of MnCo2O4 nanoflakes like thin films: effect of deposition parameter on supercapacitive performance

First report on deposition and supercapacitive performance of grass-like CuO thin films by liquid phase deposition on flat and mesh stainless steel (SS). The maximum specific capacitances on flat and mesh SS are 552 and 849 F g−1.

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Supercapacitive performance of chemically synthesized polypyrrole thin films: effect of monomer to oxidant ratio

Journal of Materials Science Materials in Electronics ◽

10.1007/s10854-014-1858-6 ◽

2014 ◽

Vol 25 (5) ◽

pp. 2188-2198 ◽

Cited By ~ 5

Author(s):

B. H. Patil ◽

R. N. Bulakhe ◽

C. D. Lokhande

Keyword(s):

Thin Films ◽

Supercapacitive Performance

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Conductivity of Yittria-Stabilized Zirconia Nanostructure Electrolyte for Solid Oxide Fuel Cell Application by Using RF Magnetron Sputtering

Solid State Phenomena ◽

10.4028/www.scientific.net/ssp.268.352 ◽

2017 ◽

Vol 268 ◽

pp. 352-357

Author(s):

S.Y. Jaffar ◽

Yussof Wahab ◽

Rosnita Muhammad ◽

Z. Othaman ◽

Zuhairi Ibrahim ◽

...

Keyword(s):

Thin Film ◽

Thin Films ◽

Magnetron Sputtering ◽

Rf Magnetron Sputtering ◽

Stabilized Zirconia ◽

Deposition Parameter ◽

Deposition Parameters ◽

Ysz Thin Film ◽

Temperature Rate ◽

Lower Temperature

Yttria-stabilized zirconia (YSZ) thin films were deposited successfully using RF magnetron sputtering. The substrate had been used are sapphire glass. A pure ceramic of Zr-Y is synthesized and processed into a planar magnetron target which is reactively sputtered with an Argon-Oxygen gas mixture to form Zr-Y-O nanostructure. The aim of this research is to study the conductivity and roughness YSZ thin film by using RF magnetron sputtering by varying the temperature deposition parameter. By lowering the YSZ thin film into nanostructure would enable for SOFC to be operate at lower temperature below 400°C. The YSZ nanostructure were controlled by varying the deposition parameters, including the deposition temperature and the substrate used. The crystalline of YSZ structure at 100W and temperature 300°C. The surface morphology of the films proved that at 300°C temperature rate deposition showed optimum growth morphology and density of YSZ thin films. Besides, the high deposition subtrate temperature affected the thickness of YSZ thin film at 80nm by using surface profiler. A higher rate of deposition is achievable when the sputtering mode of the Zr-Y target is metallic as opposed to oxide. YSZ is synthesizing to obtain the optimum thin film for SOFC application.

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Electrochemical supercapacitive performance of spray deposited NiSnO 3 thin films

Thin Solid Films ◽

10.1016/j.tsf.2017.05.007 ◽

2017 ◽

Vol 634 ◽

pp. 33-39 ◽

Cited By ~ 5

Author(s):

Abhijit A. Yadav ◽

U.J. Chavan

Keyword(s):

Thin Films ◽

Supercapacitive Performance

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Electrochemical supercapacitive performance of Hematite α-Fe2O3 thin films prepared by spray pyrolysis from non-aqueous medium

Thin Solid Films ◽

10.1016/j.tsf.2016.08.062 ◽

2016 ◽

Vol 616 ◽

pp. 351-358 ◽

Cited By ~ 14

Author(s):

Abhijit A. Yadav ◽

T.B. Deshmukh ◽

R.V. Deshmukh ◽

D.D. Patil ◽

U.J. Chavan

Keyword(s):

Thin Films ◽

Spray Pyrolysis ◽

Aqueous Medium ◽

Supercapacitive Performance

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Optimization of deposition parameter of Cr doped Eu2O3 thin films

10.1063/5.0001416 ◽

2020 ◽

Author(s):

Ram Prakash ◽

Sandeep Kumar

Keyword(s):

Thin Films ◽

Deposition Parameter

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Pulsed Laser Deposition of Collagen Thin Films

MRS Proceedings ◽

10.1557/proc-414-65 ◽

1995 ◽

Vol 414 ◽

Cited By ~ 1

Author(s):

J. A. Conklin ◽

C. M. Cotell ◽

T. W. Barnett ◽

D. C. Hansen

Keyword(s):

Thin Films ◽

Pulsed Laser Deposition ◽

Pulsed Laser ◽

Helical Structure ◽

Film Deposition ◽

Laser Deposition ◽

X Ray Diffraction ◽

Deposition Parameter ◽

Si Substrates ◽

Vapor Quenching

AbstractThin films of collagen were prepared by pulsed laser deposition (PLD) at room temperature on Si substrates using a KrF laser (248 nm) over a fluence range from 0.2–1.5 Jcm-2. The effects on film composition and morphology of ambient gas (Ar, Ar/H2O vapor), quenching atmosphere (Ar, Ar/H2O vapor), and fluence were examined. Fourier transform infrared spectroscopy (FT- IR) demonstrated that, independent of deposition parameter, the PLD films contained the characteristic Amide I and II functionalities of the collagen target and indicated that the secondary structure was altered by the PLD process. The surface morphology of the films was a function of the laser fluence and the gas environment during either film deposition or quenching at the end of deposition. Preliminary gel electrophoresis examination of deposited films suggested the collagen had not maintained the triple helical structure of the native collagen. X-Ray diffraction (XRD) indicated that all of the films, deposited under any conditions, were predominantly amorphous.

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