liquid phase deposition
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2022 ◽  
Vol 234 ◽  
pp. 111433
Author(s):  
Jui-Yu Wang ◽  
Chien-Sheng Huang ◽  
Sin-Liang Ou ◽  
Yun-Shao Cho ◽  
Jung-Jie Huang

2021 ◽  
Vol 12 (1) ◽  
pp. 30
Author(s):  
Anton S. Voronin ◽  
Ivan V. Nemtsev ◽  
Maxim S. Molokeev ◽  
Mikhail M. Simunin ◽  
Ekaterina A. Kozlova ◽  
...  

This paper considers the photoelectrochemical characteristics of a composite porous TiO2 thin film with deposited plasmonic gold nanoparticles. The deposition of gold nanoparticles was carried out by the laser-induced chemical liquid-phase deposition (LCLD) method. The structural characteristics of the composite have been studied; it has been shown that the porous TiO2 film has a lattice related to the tetragonal system and is in the anatase phase. Gold nanoparticles form on the surface of a porous TiO2 film. A complex of photoelectrochemical measurements was carried out. It was shown that the deposition of plasmonic gold nanoparticles led to a significant increase in the photocurrent density by ~820%. The proposed concept is aimed at testing the method of forming a uniform layer of plasmonic gold nanoparticles on a porous TiO2 film, studying their photocatalytic properties for further scaling, and obtaining large area Au/TiO2/FTO photoelectrodes, including in the roll-to-roll process.


2021 ◽  
Vol 11 (18) ◽  
pp. 8695
Author(s):  
Han-Guel Kim ◽  
Min-Soo Park

Glass is a very stable material at room temperature and has good resistance to gas, bacteria, and organisms. Due to the development of the electronic industry, the industrial demand for creating a conductive pattern on glass is increasing rapidly. To create conductive circuit patterns on the glass surface, non-contact methods based on high energy sources or chemical methods are generally used. However, these methods have disadvantages such as low conductivity, high cost, and size limitations. Processes such as LCLD (laser-induced chemical liquid phase deposition) have been widely studied to solve this problem. However, it has a fatal disadvantage of being slow. Therefore, in this study, various process changes were attempted to improve productivity and conductivity. In particular, sufficient thermal energy was supplied with high laser power for a stable chemical reduction, and the scanning path was changed in various shapes to minimize the ablation that occurs at this time. Through this, it was possible to disperse the overlapped laser energy of high power to widen the activation area of the reduction reaction. With this proposed LCLD process, it is possible to achieve good productivity and fabricate conductive circuit patterns faster than in previous studies.


2021 ◽  
pp. 1-15
Author(s):  
Yunjie Yang ◽  
Yan Xiang ◽  
Aiming Bu ◽  
Yongfu Zhang ◽  
Xiaolin Wei ◽  
...  

2021 ◽  
Vol 131 ◽  
pp. 105872
Author(s):  
Chao-Nan Chen ◽  
Yu-Wu Wang ◽  
Ying-Rong Ho ◽  
Chia-Ming Chang ◽  
Wei-Chieh Huang ◽  
...  

2021 ◽  
Vol 5 (2) ◽  
pp. 175-181
Author(s):  
Marjoni Imamora Ali Umar ◽  
Mardiani Mardiani ◽  
Elvy Rahmi Mawarnis ◽  
Akrajas Ali Umar

This paper reports ZnPt bimetallic nanoparticles (ZnPtBNs) synthesis through the liquid phase deposition (LPD) of of Zn(NO3)2.6H2O onto the indium-titanium oxide (ITO) substrates at various concentrations. The Effects of growth solution, the morphology, structural, and sheet resistance were studied. After preparation, the materials were characterized by using field emission electron microscopy (FESEM), energy dispersive X-ray (EDX), X-ray diffraction (XRD) and Four Point Probe (FPP) measurement by using Keithley 2401 source-meter. By inserting a growth solution into the ITO substrate the ZnPtBNs was successfully in-situ prepared. The synthesized ZnPtBNs exhibited homogeneous, fibrous at the (111) orientation with an average diameter of 100-700 nm. The atomic ratio of Zn:Pt and sheet resistance of ZnPtBNs decreased with the increase of Zn(NO3)2.6H2O concentration. The optimal elemental composition of the sample was at a ratio of Zn:Pt (1:25) obtained at 0.467 mM of Zn(NO3)2.6H2O. It showed the smallest sheet resistance (13.41 ?) which was 38% lower than the ITO sheet resistance (18.44 ?).


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