AIBA as Free Radical Initiator for Abrasive-Free Polishing of Hard Disk Substrate

2015 ◽  
Vol 44 (4) ◽  
pp. 1245-1252
Author(s):  
Hong Lei ◽  
Xiaoyan Ren
2014 ◽  
Vol 599-601 ◽  
pp. 44-47
Author(s):  
Liang Fang ◽  
Hong Lei ◽  
Rong Zhao

With high requirement setting for hard disk substrate surface quality, abrasive-free polishing (AFP) has attracted more researchers’ attention. In this paper, the influence of Mn (Ⅱ) ion on AFP of hard disk substrate in the H2O2based slurry was investigated. The experiments results show that Mn (Ⅱ) ion can effectively increase the material remove rate (MRR) and improve the planarization of hard disk substrate. Furthermore, the acting mechanism of Mn (Ⅱ) ion in AFP of hard disk substrate was analyzed. The electron spin-resonance spectroscopy (EPR) analysis shows that Mn (Ⅱ) ion in the H2O2based slurry not only can increase the concentration of ·OH free radical, but also can make H2O2decompose to ·O2–free radical. These free radicals can accelerate the chemical etching and increase the MRR of hard disk substrate.


2016 ◽  
Vol 294 (6) ◽  
pp. 981-991 ◽  
Author(s):  
Nívia N. Marques ◽  
Bruna V. Lima ◽  
Valdelice R. Silveira ◽  
Bruna L. B. Lima ◽  
Ana M. S. Maia ◽  
...  

2007 ◽  
Vol 44 (6) ◽  
pp. 605-611 ◽  
Author(s):  
Miriam F. Beristain ◽  
Eduardo Muñoz ◽  
Takeshi Ogawa

2002 ◽  
Vol 177 (5) ◽  
pp. 1109-1116 ◽  
Author(s):  
S. Munavalli ◽  
D. K. Rohrbaugh ◽  
D. I. Rossman ◽  
H. D. Durst

2009 ◽  
pp. 993-994
Author(s):  
Jiazhen Sun ◽  
Yan Zhou ◽  
Jianbin Luo ◽  
Yan Liu ◽  
Guoshun Pan ◽  
...  

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