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Influence of the Rotation Frequency of a Disk Substrate Holder on the Crystal Structure Characteristics of MOCVD-Grown GaAs Layers

2018 ◽  
Vol 63 (2) ◽  
pp. 211-215 ◽  
Author(s):  
P. B. Boldyrevskii ◽  
D. O. Filatov ◽  
I. A. Kazantseva ◽  
M. V. Revin ◽  
D. S. Smotrin ◽  
...  
Keyword(s):  
Crystal Structure ◽  
Rotation Frequency ◽  
Substrate Holder ◽  
Structure Characteristics ◽  
Disk Substrate

scholarly journals Calculation of the distribution of film thickness on a rotating disk substrate in a sputtering system with long plate targets

2017 ◽  
Vol 872 ◽  
pp. 012028
Author(s):  
O D Volpian ◽  
I M Drozd ◽  
A I Kuzmichev ◽  
Yu A Obod
Keyword(s):  
Film Thickness ◽  
Rotating Disk ◽  
Disk Substrate ◽  
Sputtering System

Blue-laser scanned imaging system using positioning marks formed on an optical disk substrate

2017 ◽  
Vol 56 (5) ◽  
pp. 058003 ◽  
Author(s):  
Takayuki Shima ◽  
Xiaomin Wang ◽  
Hideyuki Shiramizu ◽  
Makoto Fujimaki ◽  
Koichi Awazu ◽  
...  
Keyword(s):  
Imaging System ◽  
Optical Disk ◽  
Blue Laser ◽  
Disk Substrate

Effects of non-spherical colloidal silica slurry on Al-NiP hard disk substrate CMP application

2016 ◽  
Vol 360 ◽  
pp. 59-68 ◽  
Author(s):  
Sideq Salleh ◽  
Izman Sudin ◽  
Arobi Awang
Keyword(s):  
Colloidal Silica ◽  
Hard Disk ◽  
Hard Disk Substrate ◽  
Silica Slurry ◽  
Disk Substrate

AIBA as Free Radical Initiator for Abrasive-Free Polishing of Hard Disk Substrate

2015 ◽  
Vol 44 (4) ◽  
pp. 1245-1252
Author(s):  
Hong Lei ◽  
Xiaoyan Ren
Keyword(s):  
Free Radical ◽  
Hard Disk ◽  
Radical Initiator ◽  
Free Radical Initiator ◽  
Hard Disk Substrate ◽  
Disk Substrate

Effect of Mn (II) Ion on Abrasive-Free Polishing of Hard Disk Substrate

2014 ◽  
Vol 599-601 ◽  
pp. 44-47
Author(s):  
Liang Fang ◽  
Hong Lei ◽  
Rong Zhao
Keyword(s):  
Free Radical ◽  
Chemical Etching ◽  
Substrate Surface ◽  
Hard Disk ◽  
Electron Spin Resonance Spectroscopy ◽  
Resonance Spectroscopy ◽  
Spin Resonance ◽  
Acting Mechanism ◽  
Hard Disk Substrate ◽  
Disk Substrate

With high requirement setting for hard disk substrate surface quality, abrasive-free polishing (AFP) has attracted more researchers’ attention. In this paper, the influence of Mn (Ⅱ) ion on AFP of hard disk substrate in the H2O2based slurry was investigated. The experiments results show that Mn (Ⅱ) ion can effectively increase the material remove rate (MRR) and improve the planarization of hard disk substrate. Furthermore, the acting mechanism of Mn (Ⅱ) ion in AFP of hard disk substrate was analyzed. The electron spin-resonance spectroscopy (EPR) analysis shows that Mn (Ⅱ) ion in the H2O2based slurry not only can increase the concentration of ·OH free radical, but also can make H2O2decompose to ·O2–free radical. These free radicals can accelerate the chemical etching and increase the MRR of hard disk substrate.

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