Phenomenology-based model predictive control of electron density in Ar/SF6 capacitively coupled etch plasma

Author(s):  
Sangwon Ryu ◽  
Ji-Won Kwon ◽  
Ingyu Lee ◽  
Jihoon Park ◽  
Gon-Ho Kim
2011 ◽  
Vol 131 (7) ◽  
pp. 536-541 ◽  
Author(s):  
Tarek Hassan Mohamed ◽  
Abdel-Moamen Mohammed Abdel-Rahim ◽  
Ahmed Abd-Eltawwab Hassan ◽  
Takashi Hiyama

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