Modelling of a new parallel-flow CVD reactor for low pressure silicon deposition
1992 ◽
Vol 47
(9-11)
◽
pp. 2921-2926
◽
1965 ◽
Vol 112
(7)
◽
pp. 710
◽
1999 ◽
Vol 146
(1)
◽
pp. 103-110
◽
Keyword(s):
1974 ◽
Vol 32
◽
pp. 544-545
1988 ◽
Vol 46
◽
pp. 434-435
Keyword(s):
2002 ◽
Vol 82
(1)
◽
pp. 137-165
◽