Characterization of flame spread over PMMA using holographic interferometry sample orientation effects

1988 ◽  
Vol 71 (2) ◽  
pp. 189-204 ◽  
Author(s):  
Akihiko Ito ◽  
Takashi Kashiwagi
2015 ◽  
Vol 48 (2) ◽  
pp. 528-532 ◽  
Author(s):  
Peter Zaumseil

The occurrence of the basis-forbidden Si 200 and Si 222 reflections in specular X-ray diffraction ω–2Θ scans is investigated in detail as a function of the in-plane sample orientation Φ. This is done for two different diffractometer types with low and high angular divergence perpendicular to the diffraction plane. It is shown that the reflections appear for well defined conditions as a result of multiple diffraction, and not only do the obtained peaks vary in intensity but additional features like shoulders or even subpeaks may occur within a 2Θ range of about ±2.5°. This has important consequences for the detection and verification of layer peaks in the corresponding angular range.


1998 ◽  
Vol 16 (6) ◽  
pp. 437-457 ◽  
Author(s):  
Ghassan Tashtoush ◽  
Kozo Saito ◽  
Clifford Cremers ◽  
Louis Gritzo

Fuel ◽  
2022 ◽  
Vol 308 ◽  
pp. 121919
Author(s):  
Hanyu Xiong ◽  
Xiaolei Zhang ◽  
Yanli Miao ◽  
Longhua Hu
Keyword(s):  

2009 ◽  
Vol 282 (15) ◽  
pp. 3127-3131 ◽  
Author(s):  
N.S. Shinde ◽  
M.C. Rath ◽  
H.D. Dhaigude ◽  
C.D. Lokhande ◽  
V.J. Fulari

2001 ◽  
Author(s):  
Pietro Ferraro ◽  
Sergio De Nicola ◽  
Andrea Finizio ◽  
Simonetta Grilli ◽  
Giovanni Pierattini

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