Growth of epitaxial TiN films deposited on MgO(100) by reactive magnetron sputtering: The role of low-energy ion irradiation during deposition

1988 ◽  
Vol 92 (3-4) ◽  
pp. 639-656 ◽  
Author(s):  
L. Hultman ◽  
S.A. Barnett ◽  
J.-E. Sundgren ◽  
J.E. Greene
Keyword(s):  
Magnetron Sputtering ◽  
Ion Irradiation ◽  
Low Energy ◽  
Reactive Magnetron Sputtering ◽  
Reactive Magnetron ◽  
Tin Films

Low‐energy ion irradiation during film growth for reducing defect densities in epitaxial TiN(100) films deposited by reactive‐magnetron sputtering

1987 ◽  
Vol 61 (2) ◽  
pp. 552-555 ◽  
Author(s):  
L. Hultman ◽  
U. Helmersson ◽  
S. A. Barnett ◽  
J.‐E. Sundgren ◽  
J. E. Greene
Keyword(s):  
Magnetron Sputtering ◽  
Film Growth ◽  
Ion Irradiation ◽  
Low Energy ◽  
Reactive Magnetron Sputtering ◽  
Reactive Magnetron ◽  
Defect Densities

Development of preferred orientation in polycrystalline NaCl-structure δ-TaN layers grown by reactive magnetron sputtering: Role of low-energy ion surface interactions

2002 ◽  
Vol 92 (9) ◽  
pp. 5084-5093 ◽  
Author(s):  
C.-S. Shin ◽  
D. Gall ◽  
Y.-W. Kim ◽  
N. Hellgren ◽  
I. Petrov ◽  
...  
Keyword(s):  
Magnetron Sputtering ◽  
Surface Interactions ◽  
Preferred Orientation ◽  
Low Energy ◽  
Reactive Magnetron Sputtering ◽  
Reactive Magnetron

Role of carbon in the formation of hard Ge1−xCx thin films by reactive magnetron sputtering

2011 ◽  
Vol 406 (13) ◽  
pp. 2658-2662 ◽  
Author(s):  
Chaoquan Hu ◽  
Liang Qiao ◽  
Hongwei Tian ◽  
Xianyi Lu ◽  
Qing Jiang ◽  
...  
Keyword(s):  
Thin Films ◽  
Magnetron Sputtering ◽  
Reactive Magnetron Sputtering ◽  
Reactive Magnetron
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