Chemical vapour deposition (CVD) of tungsten and tungsten carbide from tungsten hexachloide

1992 ◽  
Vol 47 (6) ◽  
pp. 57
Keyword(s):  
Tungsten Carbide ◽  
Chemical Vapour Deposition ◽  
Vapour Deposition ◽  
Chemical Vapour ◽  
And Tungsten

XRD Studies on Residual Stress of the Diamond Films Grown Using Hot Filament Chemical Vapour Deposition Technique on Silicon Nitride and Tungsten Carbide Substrates

2013 ◽  
Vol 686 ◽  
pp. 325-330 ◽  
Author(s):  
Esah Hamzah ◽  
Tze Mi Yong ◽  
Kevin Chee Mun Fai
Keyword(s):  
Residual Stress ◽  
Silicon Nitride ◽  
Tungsten Carbide ◽  
Chemical Vapour Deposition ◽  
Vapour Deposition ◽  
Diamond Films ◽  
Chemical Vapour ◽  
Deposition Technique ◽  
Chemical Vapour Deposition Technique ◽  
Hot Filament

This study analyses residual stress measurement using X-Ray diffraction method on ultrafine-polycrystalline diamonds and polycrystalline diamonds films grown using Hot Filament Chemical Vapour Deposition technique (HFCVD) on silicon nitride(Si3N4) and tungsten carbide (WC) substrates in the same chamber at the same time with varied pretreatments prior to HFCVD diamond deposition. Measurements were taken perpendicular to the surface and the measured residual stress states of the diamond films are in compression. Thus, assuming isotropic properties of the film, the diamond films grown have tension residual stress parallel to the surface of the substrate. Residual stress is estimated to have the lowest stress for substrate that has undergone 5g/liter silicon carbide seeding process. Effects of residual stress to adhesion are discussed for both substrates.

Diamond chemical vapour deposition on seeded cemented tungsten carbide substrates

2006 ◽  
Vol 515 (1) ◽  
pp. 158-163 ◽  
Author(s):  
Gil Cabral ◽  
J.C. Madaleno ◽  
E. Titus ◽  
N. Ali ◽  
J. Grácio
Keyword(s):  
Tungsten Carbide ◽  
Chemical Vapour Deposition ◽  
Vapour Deposition ◽  
Chemical Vapour ◽  
Cemented Tungsten Carbide

Tantalum chemical vapour deposition on steel and tungsten substrates in the TaBr5-Cd-He system

2019 ◽  
Vol 377 ◽  
pp. 124893 ◽  
Author(s):  
O.Yu. Goncharov ◽  
I.V. Sapegina ◽  
R.R. Faizullin ◽  
L.Kh. Baldaev
Keyword(s):  
Chemical Vapour Deposition ◽  
Vapour Deposition ◽  
Chemical Vapour ◽  
And Tungsten

Chemical vapour deposition of diamond films onto tungsten carbide dental burs

2004 ◽  
Vol 37 (11-12) ◽  
pp. 957-964 ◽  
Author(s):  
Waqar Ahmed ◽  
Htet Sein ◽  
Mark Jackson ◽  
Riccardo Polini
Keyword(s):  
Tungsten Carbide ◽  
Chemical Vapour Deposition ◽  
Vapour Deposition ◽  
Diamond Films ◽  
Chemical Vapour ◽  
Dental Burs

Effect of Hot Filament Chemical Vapour Deposition Growth Method on Tungsten Carbide Nanostructures

2015 ◽  
Vol 39 (6) ◽  
pp. 328-331
Author(s):  
A. Jafari ◽  
E. Akbarnejad ◽  
M. Ghoranneviss ◽  
N. Fasihi Yazdi ◽  
A. Rezaei
Keyword(s):  
Tungsten Carbide ◽  
Chemical Vapour Deposition ◽  
Vapour Deposition ◽  
Chemical Vapour ◽  
Growth Method ◽  
Hot Filament
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