Structural changes in amorphous Pd77Si17Cu6 due to cold rolling and low temperature annealing

An investigation has been made of the structural changes that accompany low-temperature annealing (structural relaxations) in two different metallic glasses using X-ray and neutron diffraction, calorimetry, and density measurements. The structure of Fe83B17 having the archetypal composition of transition-metal – metalloid glasses appears to be more susceptible to structural relaxation than Ni64B36 glass with a higher metalloid content. This behaviour is reflected in the smaller enthalpy of relaxation of the Ni64B36 glass. The structural changes observed are discussed in terms of current structural models.

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Structural Changes Accompanying the Low-Temperature Annealing of YBa2Cu3O7−δ (0.3 ≤ δ ≤ 0.4): Transformation of the 123 Phase to a 124-Type Structure

Solid State Chemistry - World Scientific Series in 20th Century Chemistry ◽

10.1142/9789812795892_0046 ◽

1995 ◽

pp. 567-572

Author(s):

R. NAGARAJAN ◽

C. N. R. RAO

Keyword(s):

Low Temperature ◽

Structural Changes ◽

Type Structure ◽

Low Temperature Annealing

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Structural Changes in Amorphous Silicon Annealed at Low Temperatures

MRS Proceedings ◽

10.1557/proc-664-a19.9 ◽

2001 ◽

Vol 664 ◽

Author(s):

Branko Pivac ◽

Pavo Dubček ◽

Ognjen Milat ◽

Ivan Zulim

Keyword(s):

Low Temperature ◽

Amorphous Silicon ◽

Structural Properties ◽

Low Temperatures ◽

Structural Changes ◽

Void Size ◽

Dangling Bonds ◽

X Ray ◽

Low Temperature Annealing ◽

Hydrogen Dilution

ABSTRACTThe hydrogen dilution in the course of production of amorphous silicon (a-Si) influences its structural properties, which affect significantly light-induced degradation. We used FTIR, X-ray reflectivity and GISAXS analysis to monitor the structural changes occurring during the low temperature annealing of undoped a-Si:H films. FTIR results show that upon annealing at very low temperatures, hydrogen is moved from its positions (voids) where it was accumulated unbonded to silicon and is subsequently trapped at dangling bonds, enhancing disorder. X-ray reflectivity and GISAXS measurements confirmed the enhancement of the void size.

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Low-temperature annealing of YBa2Cu3O7-x

Proceedings, annual meeting, Electron Microscopy Society of America ◽

10.1017/s0424820100120849 ◽

1992 ◽

Vol 50 (1) ◽

pp. 88-89

Author(s):

R.L. Sabatini ◽

Yimei Zhu ◽

Masaki Suenaga ◽

A.R. Moodenbaugh

Keyword(s):

Electron Microscopy ◽

Transmission Electron Microscopy ◽

Low Temperature ◽

Oxygen Diffusion ◽

Diffusion Rate ◽

Oxygen Depletion ◽

Low Temperature Annealing ◽

Transmission Electron ◽

Microstructural Effects ◽

Oxygen Diffusion Rate

Low temperature annealing (<400°C) of YBa2Cu3O7x in a ozone containing oxygen atmosphere is sometimes carried out to oxygenate oxygen deficient thin films. Also, this technique can be used to fully oxygenate thinned TEM specimens when oxygen depletion in thin regions is suspected. However, the effects on the microstructure nor the extent of oxygenation of specimens has not been documented for specimens exposed to an ozone atmosphere. A particular concern is the fact that the ozone gas is so reactive and the oxygen diffusion rate at these temperatures is so slow that it may damage the specimen by an over-reaction. Thus we report here the results of an investigation on the microstructural effects of exposing a thinned YBa2Cu3O7-x specimen in an ozone atmosphere using transmission electron microscopy and energy loss spectroscopy techniques.

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