Reactive D.C. sputtering with the magnetron-plasmatron for tantalum pentoxide and titanium dioxide films
2011 ◽
Vol 3
(8)
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pp. 645-648
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2011 ◽
Vol 2
(2)
◽
pp. 73-81
2015 ◽
Vol 5
(2)
◽
pp. 65-67
Keyword(s):
2014 ◽
Vol 116
◽
pp. 182-186
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Keyword(s):
2017 ◽
Vol 310
◽
pp. 173-179
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2007 ◽
Vol 33
(3-5)
◽
pp. 225-237
◽
Keyword(s):
2009 ◽
Vol 255
(12)
◽
pp. 6067-6072
◽
Keyword(s):