Reactive D.C. sputtering with the magnetron-plasmatron for tantalum pentoxide and titanium dioxide films

1979 ◽  
Vol 63 (2) ◽  
pp. 369-375 ◽  
Author(s):  
S. Schiller ◽  
U. Heisig ◽  
K. Steinfelder ◽  
J. Strümpfel
LWT ◽  
2014 ◽  
Vol 57 (2) ◽  
pp. 548-555 ◽  
Author(s):  
Zhe Wang ◽  
Ning Zhang ◽  
Huai-yu Wang ◽  
Si-yao Sui ◽  
Xiu-xiu Sun ◽  
...  

Author(s):  
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Ryota Oguri ◽  
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2014 ◽  
Vol 116 ◽  
pp. 182-186 ◽  
Author(s):  
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Maryory Gómez ◽  
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