On the role of carrier gas in the deposition kinetics of SiO2 films produced by low temperature chemical vapour deposition

1987 ◽  
Vol 146 (2) ◽  
pp. 183-189 ◽  
Author(s):  
C. Cobianu ◽  
C. Pavelescu ◽  
E. Segal
2001 ◽  
Vol 231 (1-2) ◽  
pp. 242-247 ◽  
Author(s):  
K. Shalini ◽  
Anil U. Mane ◽  
S.A. Shivashankar ◽  
M. Rajeswari ◽  
S. Choopun

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