On the role of carrier gas in the deposition kinetics of SiO2 films produced by low temperature chemical vapour deposition
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2001 ◽
Vol 11
(PR3)
◽
pp. Pr3-189-Pr3-196
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1996 ◽
Vol 166
(1-4)
◽
pp. 628-630
◽
2001 ◽
Vol 231
(1-2)
◽
pp. 242-247
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