Studies on chemical sputtering of silicon and carbon in Ar—H2 glow discharge plasma by optical emission spectroscopy

1991 ◽  
Vol 205 (1) ◽  
pp. 6-12 ◽  
Author(s):  
Kouichi Tsuji ◽  
Kichinosuke Hirokawa
Keyword(s):  
Glow Discharge ◽  
Emission Spectroscopy ◽  
Optical Emission Spectroscopy ◽  
Discharge Plasma ◽  
Optical Emission ◽  
Glow Discharge Plasma ◽  
Chemical Sputtering

Quantitative Studies of Glow-Discharge Deposition Using Optical Emission Spectroscopy

1984 ◽  
Vol 38 ◽  
Author(s):  
F. J. Kampas
Keyword(s):  
Electrical Properties ◽  
Glow Discharge ◽  
Emission Spectroscopy ◽  
Optical Emission Spectroscopy ◽  
Optical Emission ◽  
Secondary Electrons ◽  
Rf Discharges ◽  
Quantitative Studies ◽  
Glow Discharge Deposition

AbstractIntensities of CH optical emission and electrical properties of methane rf discharges as a function of pressure are presented and discussed. The results are consistent with a model in which the properties of the discharge are dominated by secondary electrons traversing the gap between the electrodes.

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