Thermoelectric power of polycrystalline Si films prepared by microwave plasma chemical vapour deposition

Thin Solid Films ◽

10.1016/0040-6090(96)08600-2 ◽

1996 ◽

Vol 281-282 ◽

pp. 159-161 ◽

Author(s):

So Yonekubo ◽

Kiichi Kamimura ◽

Yoshiharu Onuma

Keyword(s):

Thermoelectric Power ◽

Chemical Vapour Deposition ◽

Vapour Deposition ◽

Microwave Plasma ◽

Chemical Vapour ◽

Plasma Chemical ◽

Plasma Chemical Vapour Deposition ◽

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Microwave plasma chemical vapour deposition of tetramethylsilane: correlations between optical emission spectroscopy and film characteristics

Surface and Coatings Technology ◽

10.1016/s0257-8972(01)01081-7 ◽

2001 ◽

Vol 142-144 ◽

pp. 314-320 ◽

Author(s):

L. Thomas ◽

L. Maillé ◽

J.M. Badie ◽

M. Ducarroir

Keyword(s):

Chemical Vapour Deposition ◽

Emission Spectroscopy ◽

Optical Emission Spectroscopy ◽

Vapour Deposition ◽

Microwave Plasma ◽

Chemical Vapour ◽

Optical Emission ◽

Plasma Chemical ◽

Plasma Chemical Vapour Deposition ◽

Film Characteristics

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Preparation of (Tl, Bi, Pb)-Sr-Ca-Cu-O superconducting thin films by the mist microwave plasma chemical vapour deposition method

Journal of Materials Science Letters ◽

10.1007/bf00422674 ◽

1995 ◽

Vol 14 (23) ◽

pp. 1681-1683

Author(s):

N. Takahashi ◽

A. Koukitu ◽

H. Seki

Keyword(s):

Chemical Vapour Deposition ◽

Vapour Deposition ◽

Microwave Plasma ◽

Chemical Vapour ◽

Superconducting Thin Films ◽

Deposition Method ◽

Plasma Chemical ◽

Plasma Chemical Vapour Deposition ◽

Chemical Vapour Deposition Method

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MICROWAVE PLASMA CHEMICAL VAPOUR DEPOSITION OF DIAMOND: ITS GROWTH AND CHARACTERIZATION

Metallurgical Coatings and Thin Films 1990 ◽

10.1016/b978-1-85166-813-7.50013-9 ◽

1990 ◽

pp. 53-62

Author(s):

CHIA-FU CHEN ◽

KAZUHITO NISHIMURA ◽

ENSEI KO ◽

EIJI OGAWA ◽

SATORU HOSOMI ◽

...

Keyword(s):

Chemical Vapour Deposition ◽

Vapour Deposition ◽

Microwave Plasma ◽

Chemical Vapour ◽

Plasma Chemical ◽

Plasma Chemical Vapour Deposition

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The temperature dependence of the resistance of diamond film synthesized by microwave plasma chemical vapour deposition method

Vacuum ◽

10.1016/0042-207x(91)91423-l ◽

1991 ◽

Vol 42 (16) ◽

pp. 1083

Author(s):

Yang Bangchao ◽

Gou Li ◽

Jia Yuming

Keyword(s):

Temperature Dependence ◽

Chemical Vapour Deposition ◽

Diamond Film ◽

Vapour Deposition ◽

Microwave Plasma ◽

Chemical Vapour ◽

Deposition Method ◽

Plasma Chemical ◽

Plasma Chemical Vapour Deposition ◽

Chemical Vapour Deposition Method

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Field emission characteristics of nano-sheet carbon films deposited by quartz-tube microwave plasma chemical vapour deposition

Chinese Physics B ◽

10.1088/1674-1056/17/4/053 ◽

2008 ◽

Vol 17 (4) ◽

pp. 1467-1471 ◽

Author(s):

Gu Guang-Rui ◽

Jin Zhe ◽

Ito Toshimichi

Keyword(s):

Field Emission ◽

Chemical Vapour Deposition ◽

Vapour Deposition ◽

Microwave Plasma ◽

Chemical Vapour ◽

Carbon Films ◽

Quartz Tube ◽

Emission Characteristics ◽

Plasma Chemical ◽

Plasma Chemical Vapour Deposition

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Influence of the substrate bias on epitaxial growth of Si films by dc-discharge plasma chemical vapour deposition

Semiconductor Science and Technology ◽

10.1088/0268-1242/13/12/016 ◽

1998 ◽

Vol 13 (12) ◽

pp. 1426-1430 ◽

Author(s):

E Mateeva ◽

P Sutter

Keyword(s):

Epitaxial Growth ◽

Chemical Vapour Deposition ◽

Vapour Deposition ◽

Discharge Plasma ◽

Chemical Vapour ◽

Substrate Bias ◽

Plasma Chemical ◽

Dc Discharge ◽

Plasma Chemical Vapour Deposition ◽

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Diamond film growth by pulse-modulated magnetoactive microwave plasma chemical vapour deposition

Thin Solid Films ◽

10.1016/0040-6090(96)08648-8 ◽

1996 ◽

Vol 281-282 ◽

pp. 264-266 ◽

Author(s):

Akimitsu Hatta ◽

Hidetoshi Suzuki ◽

Ken-ichi Kadota ◽

Toshimichi Ito ◽

Akio Hiraki

Keyword(s):

Chemical Vapour Deposition ◽

Diamond Film ◽

Vapour Deposition ◽

Film Growth ◽

Microwave Plasma ◽

Chemical Vapour ◽

Plasma Chemical ◽

Plasma Chemical Vapour Deposition ◽

Diamond Film Growth

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Growth and properties of diamond films prepared by microwave plasma chemical vapour deposition using different oxygen-containing source gases

Surface and Coatings Technology ◽

10.1016/0257-8972(91)90263-v ◽

1991 ◽

Vol 47 (1-3) ◽

pp. 13-21 ◽

Author(s):

L. Schäfer ◽

C.-P. Klages

Keyword(s):

Chemical Vapour Deposition ◽

Vapour Deposition ◽

Microwave Plasma ◽

Diamond Films ◽

Chemical Vapour ◽

Plasma Chemical ◽

Plasma Chemical Vapour Deposition

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Deposition of crystalline C3N4 films via microwave plasma chemical vapour deposition

Materials Letters ◽

10.1016/j.matlet.2006.08.056 ◽

2007 ◽

Vol 61 (11-12) ◽

pp. 2243-2246 ◽

Author(s):

Jinchun Jiang ◽

Wenjuan Cheng ◽

Yang Zhang ◽

Minbo Lan ◽

Hesun Zhu ◽

...

Keyword(s):

Chemical Vapour Deposition ◽

Vapour Deposition ◽

Microwave Plasma ◽

Chemical Vapour ◽

Plasma Chemical ◽

Plasma Chemical Vapour Deposition

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Increasing the output power of single 808-nm laser diodes using diamond submounts produced by microwave plasma chemical vapour deposition

Quantum Electronics ◽

10.1070/qe2012v042n11abeh015042 ◽

2012 ◽

Vol 42 (11) ◽

pp. 959-960 ◽

Author(s):

E E Ashkinazi ◽

V V Bezotosnyi ◽

Vadim Yu Bondarev ◽

V I Kovalenko ◽

Vitalii I Konov ◽

...

Keyword(s):

Output Power ◽

Chemical Vapour Deposition ◽

Vapour Deposition ◽

Microwave Plasma ◽

Laser Diodes ◽

Chemical Vapour ◽

Plasma Chemical ◽

Plasma Chemical Vapour Deposition

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