Influence of the substrate bias on epitaxial growth of Si films by dc-discharge plasma chemical vapour deposition

Semiconductor Science and Technology ◽

10.1088/0268-1242/13/12/016 ◽

1998 ◽

Vol 13 (12) ◽

pp. 1426-1430 ◽

Author(s):

E Mateeva ◽

P Sutter

Keyword(s):

Epitaxial Growth ◽

Chemical Vapour Deposition ◽

Vapour Deposition ◽

Discharge Plasma ◽

Chemical Vapour ◽

Substrate Bias ◽

Plasma Chemical ◽

Dc Discharge ◽

Plasma Chemical Vapour Deposition ◽

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Diamond film deposition by downstream d.c. glow discharge plasma chemical vapour deposition

Diamond and Related Materials ◽

10.1016/0925-9635(94)90218-6 ◽

1994 ◽

Vol 3 (4-6) ◽

pp. 531-533 ◽

Author(s):

V.M. Polushkin ◽

S.N. Polyakov ◽

A.T. Rakhimov ◽

N.V. Suetin ◽

M.A. Timofeyev ◽

...

Keyword(s):

Glow Discharge ◽

Chemical Vapour Deposition ◽

Diamond Film ◽

Vapour Deposition ◽

Discharge Plasma ◽

Chemical Vapour ◽

Film Deposition ◽

Glow Discharge Plasma ◽

Plasma Chemical ◽

Plasma Chemical Vapour Deposition

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Thermoelectric power of polycrystalline Si films prepared by microwave plasma chemical vapour deposition

Thin Solid Films ◽

10.1016/0040-6090(96)08600-2 ◽

1996 ◽

Vol 281-282 ◽

pp. 159-161 ◽

Author(s):

So Yonekubo ◽

Kiichi Kamimura ◽

Yoshiharu Onuma

Keyword(s):

Thermoelectric Power ◽

Chemical Vapour Deposition ◽

Vapour Deposition ◽

Microwave Plasma ◽

Chemical Vapour ◽

Plasma Chemical ◽

Plasma Chemical Vapour Deposition ◽

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Study on I–V characteristics of diamond films synthesized by D.C. arc discharge plasma chemical vapour deposition

Thin Solid Films ◽

10.1016/0040-6090(91)90467-c ◽

1991 ◽

Vol 205 (1) ◽

pp. 39-42 ◽

Author(s):

Fangqing Zhang ◽

Wenjun Zhang ◽

Maorui Chen ◽

Guanghua Chen ◽

Xiangliu Jiang

Keyword(s):

Chemical Vapour Deposition ◽

Vapour Deposition ◽

Discharge Plasma ◽

Arc Discharge ◽

Diamond Films ◽

Chemical Vapour ◽

Plasma Chemical ◽

Plasma Chemical Vapour Deposition

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Enhancement of diamond nucleation by applying substrate bias in ECR plasma chemical vapour deposition

Carbon ◽

10.1016/s0008-6223(98)00068-2 ◽

1998 ◽

Vol 36 (5-6) ◽

pp. 569-574 ◽

Author(s):

Hyeongmin Jeon ◽

Chongmu Lee ◽

Akimitsu Hatta ◽

Toshimichi Ito ◽

Takatomo Sasaki ◽

...

Keyword(s):

Chemical Vapour Deposition ◽

Vapour Deposition ◽

Chemical Vapour ◽

Substrate Bias ◽

Plasma Chemical ◽

Diamond Nucleation ◽

Plasma Chemical Vapour Deposition

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The Effect of Mesh Bias and Substrate Bias on the Properties of a-Si:H Deposited by Triode Plasma Chemical Vapour Deposition

Japanese Journal of Applied Physics ◽

10.1143/jjap.33.5663 ◽

1994 ◽

Vol 33 (Part 1, No. 10) ◽

pp. 5663-5667 ◽

Author(s):

Ian S. Osborne ◽

Nobuhiro Hata ◽

Gautam Ganguly ◽

Akihisa Matsuda

Keyword(s):

Chemical Vapour Deposition ◽

Vapour Deposition ◽

Chemical Vapour ◽

Substrate Bias ◽

Plasma Chemical ◽

Plasma Chemical Vapour Deposition

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Vertically self-aligned conical carbon nanofibers by pulsed discharge plasma chemical vapour deposition and its field electron emission

physica status solidi (a) ◽

10.1002/pssa.200622493 ◽

2007 ◽

Vol 204 (9) ◽

pp. 3096-3101 ◽

Author(s):

Prakash R. Somani ◽

Savita P. Somani ◽

A. Yoshida ◽

T. Suzeki ◽

M. Noda ◽

...

Keyword(s):

Carbon Nanofibers ◽

Chemical Vapour Deposition ◽

Electron Emission ◽

Vapour Deposition ◽

Discharge Plasma ◽

Chemical Vapour ◽

Field Electron Emission ◽

Pulsed Discharge ◽

Plasma Chemical ◽

Plasma Chemical Vapour Deposition

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Al-Induced Crystallization Growth of Si Films by Inductively Coupled Plasma Chemical Vapour Deposition

Chinese Physics Letters ◽

10.1088/0256-307x/23/12/060 ◽

2006 ◽

Vol 23 (12) ◽

pp. 3338-3340 ◽

Author(s):

Li Jun-Shuai ◽

Wang Jin-Xiao ◽

Yin Min ◽

Gao Ping-Qi ◽

He De-Yan

Keyword(s):

Chemical Vapour Deposition ◽

Inductively Coupled Plasma ◽

Vapour Deposition ◽

Chemical Vapour ◽

Plasma Chemical ◽

Inductively Coupled ◽

Plasma Chemical Vapour Deposition ◽

Si Films ◽

Induced Crystallization

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Microwave plasma chemical vapour deposition of tetramethylsilane: correlations between optical emission spectroscopy and film characteristics

Surface and Coatings Technology ◽

10.1016/s0257-8972(01)01081-7 ◽

2001 ◽

Vol 142-144 ◽

pp. 314-320 ◽

Author(s):

L. Thomas ◽

L. Maillé ◽

J.M. Badie ◽

M. Ducarroir

Keyword(s):

Chemical Vapour Deposition ◽

Emission Spectroscopy ◽

Optical Emission Spectroscopy ◽

Vapour Deposition ◽

Microwave Plasma ◽

Chemical Vapour ◽

Optical Emission ◽

Plasma Chemical ◽

Plasma Chemical Vapour Deposition ◽

Film Characteristics

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Preparation of (Tl, Bi, Pb)-Sr-Ca-Cu-O superconducting thin films by the mist microwave plasma chemical vapour deposition method

Journal of Materials Science Letters ◽

10.1007/bf00422674 ◽

1995 ◽

Vol 14 (23) ◽

pp. 1681-1683

Author(s):

N. Takahashi ◽

A. Koukitu ◽

H. Seki

Keyword(s):

Chemical Vapour Deposition ◽

Vapour Deposition ◽

Microwave Plasma ◽

Chemical Vapour ◽

Superconducting Thin Films ◽

Deposition Method ◽

Plasma Chemical ◽

Plasma Chemical Vapour Deposition ◽

Chemical Vapour Deposition Method

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InAlGaN-based ridge-guide laser diodes using remote plasma chemical vapour deposition for enhanced performance

Novel In-Plane Semiconductor Lasers XX ◽

10.1117/12.2584047 ◽

2021 ◽

Author(s):

Josh D. Brown ◽

Satya Barik ◽

Qian Gao ◽

Brad Siskavich ◽

Marie Wintrebert-Fouquet ◽

...

Keyword(s):

Chemical Vapour Deposition ◽

Vapour Deposition ◽

Laser Diodes ◽

Chemical Vapour ◽

Remote Plasma ◽

Plasma Chemical ◽

Plasma Chemical Vapour Deposition ◽

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