The temperature dependence of the resistance of diamond film synthesized by microwave plasma chemical vapour deposition method

Vacuum ◽

10.1016/0042-207x(91)91423-l ◽

1991 ◽

Vol 42 (16) ◽

pp. 1083

Author(s):

Yang Bangchao ◽

Gou Li ◽

Jia Yuming

Keyword(s):

Temperature Dependence ◽

Chemical Vapour Deposition ◽

Diamond Film ◽

Vapour Deposition ◽

Microwave Plasma ◽

Chemical Vapour ◽

Deposition Method ◽

Plasma Chemical ◽

Plasma Chemical Vapour Deposition ◽

Chemical Vapour Deposition Method

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Preparation of (Tl, Bi, Pb)-Sr-Ca-Cu-O superconducting thin films by the mist microwave plasma chemical vapour deposition method

Journal of Materials Science Letters ◽

10.1007/bf00422674 ◽

1995 ◽

Vol 14 (23) ◽

pp. 1681-1683

Author(s):

N. Takahashi ◽

A. Koukitu ◽

H. Seki

Keyword(s):

Chemical Vapour Deposition ◽

Vapour Deposition ◽

Microwave Plasma ◽

Chemical Vapour ◽

Superconducting Thin Films ◽

Deposition Method ◽

Plasma Chemical ◽

Plasma Chemical Vapour Deposition ◽

Chemical Vapour Deposition Method

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Diamond film growth by pulse-modulated magnetoactive microwave plasma chemical vapour deposition

Thin Solid Films ◽

10.1016/0040-6090(96)08648-8 ◽

1996 ◽

Vol 281-282 ◽

pp. 264-266 ◽

Author(s):

Akimitsu Hatta ◽

Hidetoshi Suzuki ◽

Ken-ichi Kadota ◽

Toshimichi Ito ◽

Akio Hiraki

Keyword(s):

Chemical Vapour Deposition ◽

Diamond Film ◽

Vapour Deposition ◽

Film Growth ◽

Microwave Plasma ◽

Chemical Vapour ◽

Plasma Chemical ◽

Plasma Chemical Vapour Deposition ◽

Diamond Film Growth

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Synthesis of cubic BN from the gas phase by a new plasma chemical vapour deposition method using r.f. waves and a tungsten filament

Surface and Coatings Technology ◽

10.1016/0257-8972(90)90066-l ◽

1990 ◽

Vol 43-44 ◽

pp. 116-127 ◽

Author(s):

Yukio Ichinose ◽

Hidetoshi Saitoh ◽

Yoshihiko Hirotsu

Keyword(s):

Gas Phase ◽

Chemical Vapour Deposition ◽

Vapour Deposition ◽

Chemical Vapour ◽

Deposition Method ◽

Tungsten Filament ◽

Plasma Chemical ◽

Plasma Chemical Vapour Deposition ◽

Chemical Vapour Deposition Method

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Temperature dependence of the Young's modulus of diamond thin film prepared by microwave plasma chemical vapour deposition

Journal of Materials Science Letters ◽

10.1007/bf01910092 ◽

1993 ◽

Vol 12 (5) ◽

pp. 324-325 ◽

Author(s):

Y. Seino ◽

S. Nagai

Keyword(s):

Thin Film ◽

Temperature Dependence ◽

Young’S Modulus ◽

Chemical Vapour Deposition ◽

Vapour Deposition ◽

Microwave Plasma ◽

Chemical Vapour ◽

Plasma Chemical ◽

Diamond Thin Film ◽

Plasma Chemical Vapour Deposition

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Development of the quadrupole plasma chemical vapour deposition method for low temperature, high speed coating on an optical fibre

Materials Science and Engineering A ◽

10.1016/0921-5093(91)90600-r ◽

1991 ◽

Vol 139 ◽

pp. 79-84 ◽

Author(s):

Takeshi Kashima ◽

Yoshinobu Matsuda ◽

Hiroshi Fujiyama

Keyword(s):

Low Temperature ◽

Chemical Vapour Deposition ◽

Optical Fibre ◽

Vapour Deposition ◽

Chemical Vapour ◽

Deposition Method ◽

Plasma Chemical ◽

Plasma Chemical Vapour Deposition ◽

Chemical Vapour Deposition Method

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Surface characterisation of carbon films produced by plasma chemical vapour deposition method

Surface Engineering ◽

10.1179/1743294413y.0000000137 ◽

2013 ◽

Vol 29 (6) ◽

pp. 474-478 ◽

Author(s):

A. Khettache ◽

T. Staedler ◽

M. Z. Touhami ◽

H. Weiß ◽

X. Jiang

Keyword(s):

Chemical Vapour Deposition ◽

Vapour Deposition ◽

Chemical Vapour ◽

Carbon Films ◽

Deposition Method ◽

Plasma Chemical ◽

Surface Characterisation ◽

Plasma Chemical Vapour Deposition ◽

Chemical Vapour Deposition Method

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Fabrication of glass-capsuled CdTe microcrystals using laser evaporation and plasma chemical vapour deposition method

Journal of Materials Science ◽

10.1007/bf00975078 ◽

1994 ◽

Vol 29 (5) ◽

pp. 1295-1301

Author(s):

K. Tsunetomo ◽

S. Ohtsuka ◽

T. Koyama ◽

S. Tanaka

Keyword(s):

Chemical Vapour Deposition ◽

Vapour Deposition ◽

Chemical Vapour ◽

Laser Evaporation ◽

Deposition Method ◽

Plasma Chemical ◽

Plasma Chemical Vapour Deposition ◽

Chemical Vapour Deposition Method

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SYNTHESIS OF CUBIC BN FROM THE GAS PHASE BY A NEW PLASMA CHEMICAL VAPOUR DEPOSITION METHOD USING R.F. WAVES AND A TUNGSTEN FILAMENT

Metallurgical Coatings and Thin Films 1990 ◽

10.1016/b978-1-85166-813-7.50020-6 ◽

1990 ◽

pp. 116-127

Author(s):

YUKIO ICHINOSE ◽

HIDETOSHI SAITOH ◽

YOSHIHIKO HIROTSU

Keyword(s):

Gas Phase ◽

Chemical Vapour Deposition ◽

Vapour Deposition ◽

Chemical Vapour ◽

Deposition Method ◽

Tungsten Filament ◽

Plasma Chemical ◽

Plasma Chemical Vapour Deposition ◽

Chemical Vapour Deposition Method

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Microwave plasma chemical vapour deposition of tetramethylsilane: correlations between optical emission spectroscopy and film characteristics

Surface and Coatings Technology ◽

10.1016/s0257-8972(01)01081-7 ◽

2001 ◽

Vol 142-144 ◽

pp. 314-320 ◽

Author(s):

L. Thomas ◽

L. Maillé ◽

J.M. Badie ◽

M. Ducarroir

Keyword(s):

Chemical Vapour Deposition ◽

Emission Spectroscopy ◽

Optical Emission Spectroscopy ◽

Vapour Deposition ◽

Microwave Plasma ◽

Chemical Vapour ◽

Optical Emission ◽

Plasma Chemical ◽

Plasma Chemical Vapour Deposition ◽

Film Characteristics

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MICROWAVE PLASMA CHEMICAL VAPOUR DEPOSITION OF DIAMOND: ITS GROWTH AND CHARACTERIZATION

Metallurgical Coatings and Thin Films 1990 ◽

10.1016/b978-1-85166-813-7.50013-9 ◽

1990 ◽

pp. 53-62

Author(s):

CHIA-FU CHEN ◽

KAZUHITO NISHIMURA ◽

ENSEI KO ◽

EIJI OGAWA ◽

SATORU HOSOMI ◽

...

Keyword(s):

Chemical Vapour Deposition ◽

Vapour Deposition ◽

Microwave Plasma ◽

Chemical Vapour ◽

Plasma Chemical ◽

Plasma Chemical Vapour Deposition

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