891. Work function determination for molybdenum, tantalum and rhenium by the contact potential difference method

Vacuum ◽  
1971 ◽  
Vol 21 (9) ◽  
pp. 432
Keyword(s):  
Work Function ◽  
Difference Method ◽  
Contact Potential Difference ◽  
Potential Difference ◽  
Contact Potential

Changes of Contact Potential Difference Induced by Frictional Damage in Ultrahigh Vacuum

1999 ◽  
Vol 558 ◽  
Author(s):  
L. Zhang ◽  
K. Nakayama
Keyword(s):  
Atomic Force Microscope ◽  
Work Function ◽  
Contact Potential Difference ◽  
Ultrahigh Vacuum ◽  
Potential Difference ◽  
Kelvin Probe ◽  
Contact Potential ◽  
Light Load ◽  
Atomic Force ◽  
The Difference

ABSTRACTThe work function is one of the most fundamental properties of a metal surface. To clarify frictional electrification phenomena, the effects of frictional damage on the contact potential difference (CPD), which is defined by the difference between the work functions of two contacting surfaces, were investigated. Au(111) and Si(111) surfaces were scratched in an ultrahigh vacuum under a light load with the Si cantilever tip of an atomic force microscope. The contact potential difference between the scratched surface and the tip whose work function was known was measured using an ultrahigh vacuum scanning Kelvin probe force microscope (SKPM). Simultaneously, the noncontact atomic force microscope (NC-AFM) images were observed in situ. The CPD images showed clear changes between the areas with and without scratching, corresponding to the scratching track on the NC-AFM images.

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