Deposition of copper oxide, titanium oxide and indium tin oxide films by reactive magnetron sputtering

Vacuum ◽  
1991 ◽  
Vol 42 (1-2) ◽  
pp. 53-55 ◽  
Author(s):  
DN Popov ◽  
PI Docheva
2000 ◽  
Vol 370 (1-2) ◽  
pp. 33-37 ◽  
Author(s):  
Jow-Lay Huang ◽  
Yin-Tsan Jah ◽  
Bao-Shun Yau ◽  
Ching-Yun Chen ◽  
Horng-Hwa Lu

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