Properties of indium tin oxide films prepared by rf reactive magnetron sputtering at different substrate temperature

Reactive Magnetron ◽

Study of annealed indium tin oxide films prepared by rf reactive magnetron sputtering

Vacuum ◽

10.1016/0042-207x(94)00150-2 ◽

1995 ◽

Vol 46 (7) ◽

pp. 673-680 ◽

Cited By ~ 69

Author(s):

Li-jian Meng ◽

A Maçarico ◽

R Martins

Keyword(s):

Magnetron Sputtering ◽

Tin Oxide ◽

Indium Tin Oxide ◽

Oxide Films ◽

Reactive Magnetron ◽

Ion bombardment-induced enhancement of the properties of indium tin oxide films prepared by plasma-assisted reactive magnetron sputtering

Thin Solid Films ◽

10.1016/j.tsf.2009.01.012 ◽

2009 ◽

Vol 517 (16) ◽

pp. 4576-4582 ◽

Cited By ~ 12

Author(s):

M. Dudek ◽

A. Amassian ◽

O. Zabeida ◽

J.E. Klemberg-Sapieha ◽

L. Martinu

Keyword(s):

Magnetron Sputtering ◽

Tin Oxide ◽

Indium Tin Oxide ◽

Oxide Films ◽

Ion Bombardment ◽

Reactive Magnetron ◽

Transport and optical properties of indium tin oxide films fabricated by reactive magnetron sputtering

Korean Journal of Optics and Photonics ◽

10.3807/kjop.2003.14.3.343 ◽

2003 ◽

Vol 14 (3) ◽

pp. 343-348

Keyword(s):

Optical Properties ◽

Magnetron Sputtering ◽

Tin Oxide ◽

Indium Tin Oxide ◽

Oxide Films ◽

Reactive Magnetron ◽

Influence of the target-substrate distance on the properties of indium tin oxide films prepared by radio frequency reactive magnetron sputtering

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ◽

10.1116/1.582404 ◽

2000 ◽

Vol 18 (4) ◽

pp. 1668-1671 ◽

Cited By ~ 14

Author(s):

Li-Jian Meng ◽

M. P. dos Santos

Keyword(s):

Magnetron Sputtering ◽

Radio Frequency ◽

Tin Oxide ◽

Indium Tin Oxide ◽

Oxide Films ◽

Reactive Magnetron ◽

Substrate Distance ◽

Reactive Magnetron Sputtering Deposition of Indium-Tin-Oxide Films for Photovoltaic Applications

Seventh E.C. Photovoltaic Solar Energy Conference ◽

10.1007/978-94-009-3817-5_111 ◽

1987 ◽

pp. 625-629

Author(s):

A. R. Lagunas ◽

M. J. Pérez-Ilzarbe ◽

L. Delgado

Keyword(s):

Magnetron Sputtering ◽

Tin Oxide ◽

Indium Tin Oxide ◽

Oxide Films ◽

Reactive Magnetron ◽

Sputtering Deposition ◽

Photovoltaic Applications ◽

Properties of indium tin oxide films with indium tin modulation layers prepared by nano-scale controlled reactive magnetron sputtering

Thin Solid Films ◽

10.1016/0040-6090(95)08166-6 ◽

1996 ◽

Vol 279 (1-2) ◽

pp. 131-134 ◽

Cited By ~ 8

Author(s):

A.H.M. Zahirul Alam ◽

Yoshinori Takashima ◽

Kimihiro Sasaki ◽

Tomonobu Hata

Keyword(s):

Magnetron Sputtering ◽

Tin Oxide ◽

Indium Tin Oxide ◽

Oxide Films ◽

Reactive Magnetron ◽

Nano Scale ◽

Reactive Magnetron Sputtering of Indium Tin Oxide Films on Acrylics - Electrical Resistivity and Optical Properties

CrossRef Listing of Deleted DOIs ◽

10.1361/105994900770345827 ◽

2000 ◽

Vol 9 (4) ◽

pp. 424-427 ◽

Cited By ~ 6

Author(s):

Jow-Lay Huang ◽

Yin-Tsan Jah ◽

Ching-Yun Chen ◽

Bao-Shun Yau ◽

Su-Shia Lin

Keyword(s):

Electrical Resistivity ◽

Optical Properties ◽

Magnetron Sputtering ◽

Tin Oxide ◽

Indium Tin Oxide ◽

Oxide Films ◽

Reactive Magnetron ◽

Deposition of copper oxide, titanium oxide and indium tin oxide films by reactive magnetron sputtering

Vacuum ◽

10.1016/0042-207x(91)90077-v ◽

1991 ◽

Vol 42 (1-2) ◽

pp. 53-55 ◽

Cited By ~ 10

Author(s):

DN Popov ◽

PI Docheva

Keyword(s):

Magnetron Sputtering ◽

Copper Oxide ◽

Titanium Oxide ◽

Tin Oxide ◽

Indium Tin Oxide ◽

Oxide Films ◽

Reactive Magnetron ◽

Investigation of Reactive Magnetron Sputtering of Indium Tin Oxide Films on Acrylics. Lattice Parameters and Stoichiometric Compositions.

Journal of the Ceramic Society of Japan ◽

10.2109/jcersj.108.17 ◽

2000 ◽

Vol 108 (1253) ◽

pp. 17-20 ◽

Cited By ~ 3

Author(s):

Jow-Lay HUANG ◽

Yin-Tsan JAH ◽

Bao-Shun YAU ◽

Wen-Tse LO

Keyword(s):

Magnetron Sputtering ◽

Tin Oxide ◽

Indium Tin Oxide ◽

Oxide Films ◽

Lattice Parameters ◽

Reactive Magnetron ◽

Reactive magnetron sputtering of indium tin oxide films on acrylics – morphology and bonding state

Thin Solid Films ◽

10.1016/s0040-6090(00)00938-x ◽

2000 ◽

Vol 370 (1-2) ◽

pp. 33-37 ◽

Cited By ~ 21

Author(s):

Jow-Lay Huang ◽

Yin-Tsan Jah ◽

Bao-Shun Yau ◽

Ching-Yun Chen ◽

Horng-Hwa Lu

Keyword(s):

Magnetron Sputtering ◽

Tin Oxide ◽

Indium Tin Oxide ◽

Oxide Films ◽

Reactive Magnetron ◽

Bonding State ◽