Influence of the target-substrate distance on the properties of indium tin oxide films prepared by radio frequency reactive magnetron sputtering

2000 ◽  
Vol 18 (4) ◽  
pp. 1668-1671 ◽  
Author(s):  
Li-Jian Meng ◽  
M. P. dos Santos
2000 ◽  
Vol 370 (1-2) ◽  
pp. 33-37 ◽  
Author(s):  
Jow-Lay Huang ◽  
Yin-Tsan Jah ◽  
Bao-Shun Yau ◽  
Ching-Yun Chen ◽  
Horng-Hwa Lu

Sign in / Sign up

Export Citation Format

Share Document