scholarly journals Reflectometric study of surface states and oxygen adsorption on clean Si(100) and (110) surfaces

1980 ◽  
Vol 99 (1) ◽  
pp. A330
Author(s):  
P.E. Wierenga ◽  
M.J. Sparnaay ◽  
A. Van Silfhout
Keyword(s):  
Surface States ◽  
Oxygen Adsorption

scholarly journals Влияние адсорбции кислорода и фтора на электронную структуру поверхности InSb(111)

2020 ◽  
Vol 54 (1) ◽  
pp. 3
Author(s):  
А.А. Фукс ◽  
А.В. Бакулин ◽  
С.Е. Кулькова ◽  
Н.А. Валишева ◽  
А.В. Постников
Keyword(s):  
Electronic Structure ◽  
Surface States ◽  
Complete Removal ◽  
Oxygen Adsorption ◽  
Chemical Bonds ◽  
Wave Method ◽  
Initial Stage ◽  
Subsurface Layers ◽  
Projector Augmented Wave ◽  
Forbidden Gap

The projector augmented-wave method was used to study the energetics of oxygen and fluorine bonding on the InSb(111) surface depending on its termination. It is shown that the fluorine adsorption on the In-terminated surface depending on its concentration leads to a partial or complete removal of surface states induced by oxygen adsorption from the forbidden gap. Penetration of both adsorbates into subsurface layers results in breaking of In–Sb bonds and the formation of chemical bonds of fluorine and oxygen with subsurface atoms of the substrate. It is the initial stage of the formation of a fluorine-containing anode oxide layer. In the case of the InSb(111) surface terminated by antimony, oxygen adsorption contributes to a decrease in the density of surface states in the forbidden gap. The general trends in the changes of the electronic structure of the (111) surface during the fluorine and oxygen coadsorption are discussed in a set of III–V semiconductors.

scholarly journals Reflectometric study of surface states and oxygen adsorption on clean Si(100) and (110) surfaces

1980 ◽  
Vol 99 (1) ◽  
pp. 59-69 ◽  
Author(s):  
P.E. Wierenga ◽  
M.J. Sparnaay ◽  
A. Van Silfhout
Keyword(s):  
Surface States ◽  
Oxygen Adsorption

Local roughness and surface states on Si(001): Analysis of vacuum annealings and oxygen adsorption-desorption processes

1990 ◽  
Vol 41-42 ◽  
pp. 352-356 ◽  
Author(s):  
C.A. Sébenne ◽  
J.P. Lacharme ◽  
I. Andriamanantenasoa ◽  
M. Khial
Keyword(s):  
Surface States ◽  
Oxygen Adsorption ◽  
Adsorption Desorption ◽  
Local Roughness

Surface states on thin SiO2 layers induced by oxygen adsorption

1976 ◽  
Vol 36 (1) ◽  
pp. 195-198 ◽  
Author(s):  
N Jakowski ◽  
H Glaefeke
Keyword(s):  
Surface States ◽  
Oxygen Adsorption

Zero-loss omega-filtered REM and RHEED on the new Zeiss 912

1991 ◽  
Vol 49 ◽  
pp. 616-617
Author(s):  
J.C.H. Spence ◽  
J. Mayer
Keyword(s):  
Electron Microscopy ◽  
Materials Science ◽  
Surface States ◽  
Ccd Camera ◽  
Dark Field ◽  
Ion Pump ◽  
Magnetic Imaging ◽  
Reflection Electron Microscopy ◽  
Diffraction Patterns ◽  
Large Background

The Zeiss 912 is a new fully digital, side-entry, 120 Kv TEM/STEM instrument for materials science, fitted with an omega magnetic imaging energy filter. Pumping is by turbopump and ion pump. The magnetic imaging filter allows energy-filtered images or diffraction patterns to be recorded without scanning using efficient parallel (area) detection. The energy loss intensity distribution may also be displayed on the screen, and recorded by scanning it over the PMT supplied. If a CCD camera is fitted and suitable new software developed, “parallel ELS” recording results. For large fields of view, filtered images can be recorded much more efficiently than by Scanning Reflection Electron Microscopy, and the large background of inelastic scattering removed. We have therefore evaluated the 912 for REM and RHEED applications. Causes of streaking and resonance in RHEED patterns are being studied, and a more quantitative analysis of CBRED patterns may be possible. Dark field band-gap REM imaging of surface states may also be possible.

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