Production of low energy spread ion beams with multicusp sources

Author(s):  
Y Lee ◽  
L.T Perkins ◽  
R.A Gough ◽  
M Hoffmann ◽  
W.B Kunkel ◽  
...  
Keyword(s):  
1991 ◽  
Vol 223 ◽  
Author(s):  
Richard B. Jackman ◽  
Glenn C. Tyrrell ◽  
Duncan Marshall ◽  
Catherine L. French ◽  
John S. Foord

ABSTRACTThis paper addresses the issue of chlorine adsorption on GaAs(100) with respect to the mechanisms of thermal and ion-enhanced etching. The use of halogenated precursors eg. dichloroethane is also discussed in regard to chemically assisted ion beam etching (CAIBE).


1969 ◽  
Vol 72 (2) ◽  
pp. 217-219 ◽  
Author(s):  
R.B. Brown ◽  
P.D. Bourland ◽  
D. Powers

2012 ◽  
Vol 83 (2) ◽  
pp. 02B320 ◽  
Author(s):  
N. Chauvin ◽  
O. Delferrière ◽  
R. Duperrier ◽  
R. Gobin ◽  
P. A. P. Nghiem ◽  
...  

2012 ◽  
pp. 109-134 ◽  
Author(s):  
Franciszek Krok ◽  
Salah Saeed ◽  
Marek Kolmer ◽  
Marek Szymonski
Keyword(s):  

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