Study of the chemical composition of silicon nitride films obtained by chemical vapour deposition and plasma-enhanced chemical vapour deposition

Vapour Deposition ◽

Chemical Vapour ◽

Remote plasma-enhanced chemical vapour deposition of silicon nitride films: the effect of diluting nitrogen with helium

Journal of Materials Chemistry ◽

10.1039/jm9950500457 ◽

1995 ◽

Vol 5 (3) ◽

pp. 457 ◽

Cited By ~ 8

Author(s):

Sergei E. Alexandrov ◽

Michael L. Hitchman ◽

Sarkis H. Shamlian

Keyword(s):

Silicon Nitride ◽

Vapour Deposition ◽

Chemical Vapour ◽

Remote Plasma ◽

Formation of silicon nitride films by remote plasma-enhanced chemical vapour deposition

Advanced Materials for Optics and Electronics ◽

10.1002/amo.860020605 ◽

1993 ◽

Vol 2 (6) ◽

pp. 301-312 ◽

Cited By ~ 9

Author(s):

Sergei E. Alexandrov ◽

Michael L. Hitchman ◽

Sarkis Shamlian

Keyword(s):

Silicon Nitride ◽

Vapour Deposition ◽

Chemical Vapour ◽

Remote Plasma ◽

Composition, etching and optical properties of silicon nitride films deposited by plasma-enhanced chemical vapour deposition prepared in variable NH3N2 gas mixture diluted with Helium

Thin Solid Films ◽

10.1016/0040-6090(91)90519-4 ◽

1991 ◽

Vol 203 (1) ◽

pp. 87-94 ◽

Cited By ~ 13

Author(s):

B. Reynes ◽

C. Ance ◽

J.P. Stoquert ◽

J.C. Bruyère

Keyword(s):

Optical Properties ◽

Silicon Nitride ◽

Vapour Deposition ◽

Chemical Vapour ◽

Gas Mixture ◽

In-Situ XPS Studies of Thin Silicon Nitride Films on III–V Semiconductors Produced by Remote Plasma Enhanced Chemical Vapour Deposition

Plasma-Surface Interactions and Processing of Materials ◽

10.1007/978-94-009-1946-4_23 ◽

1990 ◽

pp. 327-330

Author(s):

Rana N. S. Sodhi

Keyword(s):

Silicon Nitride ◽

Vapour Deposition ◽

Chemical Vapour ◽

Remote Plasma ◽

Silicon Nitride Films ◽

In Situ Xps ◽

Thin Silicon

Analysis of the transition layer in silicon nitride films deposited by a low-pressure chemical vapour deposition

Surface and Interface Analysis ◽

10.1002/(sici)1096-9918(199907)27:7<638::aid-sia552>3.0.co;2-# ◽

1999 ◽

Vol 27 (7) ◽

pp. 638-643 ◽

Cited By ~ 5

Author(s):

Koki Tanaka ◽

Atsuko Tsuge ◽

Makoto Takiyama ◽

Ryuichi Shimizu

Keyword(s):

Silicon Nitride ◽

Transition Layer ◽

Vapour Deposition ◽

Chemical Vapour ◽

Low Pressure ◽

Silicon Nitride Films ◽

Pressure Chemical

Studies on deposition parameters of silicon-nitride films prepared by a silane?nitrogen plasma-enhanced-chemical-vapour-deposition process nitride films prepared by a silane?nitrogen

Journal of Materials Science Materials in Electronics ◽

10.1007/bf00921247 ◽

1994 ◽

Vol 5 (5) ◽

pp. 255-259 ◽

Cited By ~ 4

Author(s):

K. R. Lee ◽

K. B. Sundaram ◽

D. C. Malocha

Keyword(s):

Silicon Nitride ◽

Vapour Deposition ◽

Chemical Vapour ◽

Deposition Process ◽

Nitrogen Plasma ◽

Chemical Vapour Deposition Process ◽

Silicon Nitride Films ◽

Deposition Parameters

Silicon Nitride Films Prepared by Plasma-Enhanced Chemical Vapour Deposition (PECVD) of SiH4/NH3/N2Mixtures: Some Physical Properties

Japanese Journal of Applied Physics ◽

10.1143/jjap.25.1490 ◽

1986 ◽

Vol 25 (Part 1, No. 10) ◽

pp. 1490-1494 ◽

Cited By ~ 15

Author(s):

C. H. Ling ◽

C. Y. Kwok ◽

K. Prasad

Keyword(s):

Silicon Nitride ◽

Physical Properties ◽

Vapour Deposition ◽

Chemical Vapour ◽

Bonded hydrogen in silicon nitride films deposited by remote plasma-enhanced chemical vapour deposition

Journal of Materials Chemistry ◽

10.1039/jm9940401843 ◽

1994 ◽

Vol 4 (12) ◽

pp. 1843 ◽

Cited By ~ 1

Author(s):

Sergei E. Alexandrov ◽

Michael L. Hitchman ◽

Sarkis H. Shamlian

Keyword(s):

Silicon Nitride ◽

Vapour Deposition ◽

Chemical Vapour ◽

Remote Plasma ◽

Remote plasma chemical vapour deposition of silicon nitride films

Journal de Physique III ◽

10.1051/jp3:1992186 ◽

1992 ◽

Vol 2 (8) ◽

pp. 1421-1429 ◽

Cited By ~ 2

Author(s):

S. E. Alexandrov ◽

A. Yu. Kovalgin

Keyword(s):

Silicon Nitride ◽

Vapour Deposition ◽

Chemical Vapour ◽

Remote Plasma ◽

Plasma Chemical ◽

Silicon Nitride Films ◽

Plasma Chemical Vapour Deposition

Properties of silicon nitride films prepared by plasma-enhanced chemical vapour deposition of SiH4-N2 mixtures

Thin Solid Films ◽

10.1016/0040-6090(86)90110-0 ◽

1986 ◽

Vol 136 (1) ◽

pp. 77-83 ◽

Cited By ~ 26

Author(s):

Hideo Watanabe ◽

Kazuhisa Katoh ◽

Shin-Ichi Imagi

Keyword(s):

Silicon Nitride ◽

Vapour Deposition ◽

Chemical Vapour ◽