Remote plasma-enhanced chemical vapour deposition of silicon nitride films: the effect of diluting nitrogen with helium
Keyword(s):
1993 ◽
Vol 2
(6)
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pp. 301-312
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Keyword(s):
1990 ◽
pp. 327-330
Keyword(s):
Keyword(s):
1991 ◽
Vol 02
(C2)
◽
pp. C2-847-C2-847
2002 ◽
Vol 11
(1)
◽
pp. 97-103
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Keyword(s):
1999 ◽
Vol 27
(7)
◽
pp. 638-643
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1994 ◽
Vol 5
(5)
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pp. 255-259
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