Studies on deposition parameters of silicon-nitride films prepared by a silane?nitrogen plasma-enhanced-chemical-vapour-deposition process nitride films prepared by a silane?nitrogen
1994 ◽
Vol 5
(5)
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pp. 255-259
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1994 ◽
Vol 68-69
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pp. 719-723
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2014 ◽
Vol 20
(10-11-12)
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pp. 388-398
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