Studies on deposition parameters of silicon-nitride films prepared by a silane?nitrogen plasma-enhanced-chemical-vapour-deposition process nitride films prepared by a silane?nitrogen

1994 ◽  
Vol 5 (5) ◽  
pp. 255-259 ◽  
Author(s):  
K. R. Lee ◽  
K. B. Sundaram ◽  
D. C. Malocha
Carbon ◽  
2001 ◽  
Vol 39 (4) ◽  
pp. 621-626 ◽  
Author(s):  
Ph. Serp ◽  
R. Feurer ◽  
Ph. Kalck ◽  
Y. Kihn ◽  
J.L. Faria ◽  
...  

2014 ◽  
Vol 20 (10-11-12) ◽  
pp. 388-398 ◽  
Author(s):  
Sabine Stöckel ◽  
Susann Ebert ◽  
Maike Böttcher ◽  
Andreas Seifert ◽  
Thomas Wamser ◽  
...  

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