Surface ionization of organometallic compounds: Organic derivatives of main group III–V elements

1990 ◽  
Vol 147 (1) ◽  
pp. 213-218 ◽  
Author(s):  
Toshihiro Fujii ◽  
Kouichi Kakizaki ◽  
Hiroyuki Ishii
Keyword(s):  
Organometallic Compounds ◽  
Main Group ◽  
Surface Ionization ◽  
Group Iii ◽  
Derivatives Of

Organometallic compounds of Group III

1971 ◽  
Vol 31 (3) ◽  
pp. C49-C54 ◽  
Author(s):  
John J. Eisch ◽  
Sue Goo Rhee
Keyword(s):  
Organometallic Compounds ◽  
Group Iii

Neue Cyclophosphazene mit Metallen der III. Hauptgruppe als Ringbausteine / New Cyclophosphazenes with Metals of Main Group III as Building Blocks

1994 ◽  
Vol 49 (1) ◽  
pp. 43-49 ◽  
Author(s):  
Reinhard Hasselbring ◽  
Herbert W. Roesky ◽  
Andreas Heine ◽  
Dietmar Stalke ◽  
George M. Sheldrick
Keyword(s):  
Nmr Spectroscopy ◽  
Structure Determination ◽  
Building Blocks ◽  
Main Group ◽  
Ring Formation ◽  
Lewis Acidity ◽  
X Ray ◽  
Group Iii ◽  
Space Groups ◽  
Ring Compounds

Abstract Acylic silylated phosphazenes of the type HN(PR2NSiMe3)2 (1) react quantitatively with molecules MMe3 (M = Al, Ga, In) under ring formation and CH4 evolution. The ring compounds N(PPh2NSiMe3)2AlMe2 (2 a) and N(PPh2NSiMe3)2InMe2 (4 a) have been investiga­ ted by X-ray structure determination. 2a and 4a crystallize in the space groups P 1̄ and P 31, respectively; they show different conformations regarding the cyclohexane framework. NMR spectroscopy of the nuclei in the chelating phosphazene ligand indicates decreasing Lewis acidity of the metal containing fragments in the series AlMe2 ≥ GaMe2 > InMe2.

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