Near band-edge luminescence studies of the effect of interfacial step distribution and alloy disorder in ultrathin single quantum wells grown by MBE under RHEED determined conditions

1987 ◽  
Vol 3 (3) ◽  
pp. 313-323 ◽  
Author(s):  
F. Voillot ◽  
J.Y. Kim ◽  
W.C. Tang ◽  
A. Madhukar ◽  
P. Chen
1979 ◽  
Vol 10 (21) ◽  
Author(s):  
B. J. FITZPATRICK ◽  
R. N. BHARGAVA ◽  
S. P. HERKO ◽  
P. M. HARNACK

2009 ◽  
Vol 129 (9) ◽  
pp. 1029-1031
Author(s):  
V.F. Kovalenko ◽  
S.V. Shutov ◽  
Ye.A. Baganov ◽  
M.M. Smyikalo

2010 ◽  
Vol 107 (1) ◽  
pp. 013704 ◽  
Author(s):  
Alexander Müller ◽  
Marko Stölzel ◽  
Christof Dietrich ◽  
Gabriele Benndorf ◽  
Michael Lorenz ◽  
...  

1968 ◽  
Vol 13 (2) ◽  
pp. 51-53 ◽  
Author(s):  
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David K. Brice

2002 ◽  
Vol 229 (1) ◽  
pp. 333-337 ◽  
Author(s):  
A.L. Gurskii ◽  
H. Hamadeh ◽  
H. Kalisch ◽  
M. Heuken ◽  
G.P. Yablonskii ◽  
...  

1993 ◽  
Vol 318 ◽  
Author(s):  
Y. Shiraki ◽  
S. Fukatsu ◽  
K. Fujita ◽  
T. Usami

ABSTRACTA method to realize high quality SiGe/Si heterostructures where surface segregation seriously deteriorates the interface integrity is discussed. After clarifying the mechanism of surface segregation, a new technique, called segre-gant-assisted growth (SAG), where atoms having a strong segregation tendency are introduced at heterointerfaces is proposed and its advantages are demonstrated. Intersubband transition of electrons in the conduction band can be clearly observed even in narrow quantum wells (QWs), and the well width dependence reflecting the square shape potential is obtained in the absorption peak energy. Gas source MBE (GSMBE), which is considered to be quasi-SAG with hydrogen generated at the growth front acting as a segregant, is shown to provide high quality SiGe/Si heterostructures with abrupt interfaces. Highly efficient band edge luminescence is observed in the QWs grown by the SAG method, especially by GSMBE, and the quantum confinement effect is confirmed. Electroluminescent diodes providing band edge luminescence are fabricated by this method, suggesting a high potential for SiGe/Si heterostrucutres in device applications.


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