Nanocrystalline semiconductors for thin-film devices by microreactor-assisted chemical solution deposition

Author(s):  
Zhongwei Gao ◽  
Yu-Hsuan Yang ◽  
Ming-Huei Shen ◽  
Ho-Chun Huang ◽  
Yu-Wei Su ◽  
...  
2008 ◽  
Vol 468 (15-20) ◽  
pp. 1563-1566 ◽  
Author(s):  
W.T. Wang ◽  
G. Li ◽  
M.H. Pu ◽  
R.P. Sun ◽  
H.M. Zhou ◽  
...  

2016 ◽  
Vol 4 (47) ◽  
pp. 18457-18469 ◽  
Author(s):  
G. Maino ◽  
J. D'Haen ◽  
F. Mattelaer ◽  
C. Detavernier ◽  
A. Hardy ◽  
...  

Aqueous CSD provides LMO thin films at low T in a N2 ambient, eliminating issues with stacking and sensitive current collectors.


2013 ◽  
Vol 566 ◽  
pp. 187-190
Author(s):  
Keiichi Sasajima ◽  
Hiroshi Uchida

Thin films of (La,Sr)MnO3 (LSMO) were fabricated by industrial-versatile chemical solution deposition (CSD) technique. Well [100]-oriented LSMO films were fabricated at 650-750 °C by use of buffer layers of LaNiO3 buffer layer on a silicon substrate. The product of lower electrical resistivity is promising as an electrode of fatigue-free ferroelectric capacitor.


2002 ◽  
Vol 237-239 ◽  
pp. 482-486 ◽  
Author(s):  
Kazuyuki Suzuki ◽  
Kaori Nishizawa ◽  
Takeshi Miki ◽  
Kazumi Kato

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