scholarly journals Thick film growth of high optical quality low loss (0.1dBcm−1) Nd:Gd3Ga5O12 on Y3Al5O12 by pulsed laser deposition

2004 ◽  
Vol 223 (4) ◽  
pp. 361-371 ◽  
Author(s):  
T.C May-Smith ◽  
C Grivas ◽  
D.P Shepherd ◽  
R.W Eason ◽  
M.J.F Healy
Keyword(s):  
Pulsed Laser Deposition ◽  
Thick Film ◽  
Film Growth ◽  
Pulsed Laser ◽  
Optical Quality ◽  
Laser Deposition ◽  
Low Loss ◽  
High Optical Quality

High-optical-quality LiNbO 3 thin films obtained by pulsed laser deposition

1998 ◽  
Author(s):  
D. Ghica ◽  
Mariuca Gartner ◽  
F. Ciobanu ◽  
V. Nelea ◽  
C. Martin ◽  
...  
Keyword(s):  
Thin Films ◽  
Pulsed Laser Deposition ◽  
Pulsed Laser ◽  
Optical Quality ◽  
Laser Deposition ◽  
High Optical Quality

High optical quality cellulose thin films grown from raw natural cotton by pulsed laser deposition

2019 ◽  
Vol 125 (4) ◽  
Author(s):  
Vagelis Karoutsos ◽  
Panagiotis Raptis ◽  
Eleftherios Bagiokis ◽  
Antonella Lorusso ◽  
Alessio Perrone ◽  
...  
Keyword(s):  
Thin Films ◽  
Pulsed Laser Deposition ◽  
Pulsed Laser ◽  
Optical Quality ◽  
Laser Deposition ◽  
High Optical Quality

Layer-by-layer growth of high-optical-quality ZnO epitaxy film on Si(111) substrate using a MgO/TiN buffer layer by pulsed-laser deposition

2014 ◽  
Vol 46 (4) ◽  
pp. 243-247
Author(s):  
Xia Zhang ◽  
Hong Chen ◽  
Zhi Yan ◽  
Xiying Zhou ◽  
Wensong Lin ◽  
...  
Keyword(s):  
Pulsed Laser Deposition ◽  
Buffer Layer ◽  
Pulsed Laser ◽  
Optical Quality ◽  
Layer Growth ◽  
Laser Deposition ◽  
Layer By Layer ◽  
High Optical Quality

scholarly journals Effect of laser beam parameters on magnetic properties of Nd–Fe–B thick-film magnets fabricated by pulsed laser deposition

2011 ◽  
Vol 109 (7) ◽  
pp. 07A758 ◽  
Author(s):  
H. Fukunaga ◽  
T. Kamikawatoko ◽  
M. Nakano ◽  
T. Yanai ◽  
F. Yamashita
Keyword(s):  
Magnetic Properties ◽  
Laser Beam ◽  
Pulsed Laser Deposition ◽  
Thick Film ◽  
Pulsed Laser ◽  
Laser Deposition ◽  
Beam Parameters

Tracing the origin of oxygen for La0.6Sr0.4MnO3thin film growth by pulsed laser deposition

2015 ◽  
Vol 49 (4) ◽  
pp. 045201 ◽  
Author(s):  
J Chen ◽  
M Döbeli ◽  
D Stender ◽  
M M Lee ◽  
K Conder ◽  
...  
Keyword(s):  
Pulsed Laser Deposition ◽  
Film Growth ◽  
Pulsed Laser ◽  
Laser Deposition

Microstructure of Compositionally Graded PZT films Grown by Pulsed Laser Deposition

2008 ◽  
Vol 14 (S3) ◽  
pp. 53-56
Author(s):  
S.A.S. Rodrigues ◽  
A. Khodorov ◽  
M. Pereira ◽  
M.J.M. Gomes
Keyword(s):  
Pulsed Laser Deposition ◽  
Lead Zirconate Titanate ◽  
Film Growth ◽  
Pulsed Laser ◽  
Hysteresis Loops ◽  
Lead Zirconate ◽  
Laser Deposition ◽  
Composition Gradient ◽  
Complex Structures ◽  
Pzt Films

Ferroelectric films with a composition gradient have attracted much attention because of their large polarization offset present in the hysteresis loops. Lead Zirconate Titanate (PZT) films were deposited on Pt/TiO2/SiO2/Si substrates by Pulsed Laser Deposition (PLD) technique, using a Nd:YAG laser (Surelite) with a source pulse wavelength of 1064 nm and duration of 5-7 ns delivering an energy of 320 mJ per pulse and a laser fluence energy about 20 J/cm2. The film growth is performed in O2 atmosphere (0,40 mbar) while the substrate is heated at 600°C by a quartz lamp. Starting from ceramic targets based on PZT compositions and containing 5% mol. of excess of PbO to compensate the lead evaporation during heat treatment, three films with different compositions Zr/Ti 55/45, 65/35 and 92/8, and two types of complex structures were produced. These complex structures are in the case of the up-graded structure (UpG), with PZT (92/8) at the bottom, PZT (65/35) on middle and PZT (55/45) on the top, and for down-graded (DoG) one, that order is reversed.

ZnSe and ZnO film growth by pulsed-laser deposition

1998 ◽  
Vol 127-129 ◽  
pp. 496-499 ◽  
Author(s):  
Y.R. Ryu ◽  
S. Zhu ◽  
S.W. Han ◽  
H.W. White ◽  
P.F. Miceli ◽  
...  
Keyword(s):  
Pulsed Laser Deposition ◽  
Film Growth ◽  
Pulsed Laser ◽  
Laser Deposition ◽  
Zno Film

Incongruent pulsed laser deposition strategy for thin film growth of Ca3Co4O9 thermoelectric compound

2019 ◽  
Vol 45 (10) ◽  
pp. 13138-13143 ◽  
Author(s):  
Haiyang Hu ◽  
Fei Shao ◽  
Jikun Chen ◽  
Max Döbeli ◽  
Qingfeng Song ◽  
...  
Keyword(s):  
Thin Film ◽  
Pulsed Laser Deposition ◽  
Film Growth ◽  
Pulsed Laser ◽  
Thin Film Growth ◽  
Laser Deposition

Ultrafast Pulsed Laser Deposition of Chalcogenide Glass Films for Low-loss Optical Waveguides

2003 ◽  
Vol 780 ◽  
Author(s):  
B. Luther-Davies ◽  
V. Z. Kolev ◽  
M. J. Lederer ◽  
R. Yinlan ◽  
M. Samoc ◽  
...  
Keyword(s):  
Pulsed Laser Deposition ◽  
Repetition Rate ◽  
Pulsed Laser ◽  
Fused Silica ◽  
Laser Deposition ◽  
Process Conditions ◽  
High Optical Quality ◽  
Optical Films ◽  
Wide Range ◽  
Deposited Films

AbstractUltra-fast pulsed laser deposition using high-repetition-rate short-pulse lasers has been shown to provide high optical quality, super smooth thin films free of scattering centres. The optimized process conditions require short ps or sub-ps pulses with repetition rate in the range 1-100 MHz, depending on the target material. Ultra-fast pulsed laser deposition was used to successfully deposit atomically-smooth, 5micron thick As2S3 films. The as-deposited films were photosensitive at wavelengths close to the band edge (≈520 nm) and waveguides could be directly patterned into them by photo-darkening using an Argon ion or frequency doubled Nd:YAG laser. The linear and nonlinear optical properties of the films were measured as well as the photosensitivity of the material. The optical losses in photo-darkened waveguides were <0.2 dB/cm at wavelengths beyond 1200nm and <0.1 dB/cm in as-deposited films. The third order nonlinearity, n2,As2S3, was measured using both four-wave mixing and the z-scan technique and varied with wavelength from 100 to 200 times fused silica (n2,Silica ≈3×10-16 cm2/W) between 1500nm and 1100nm with low nonlinear absorption.Encouraged by the Ultrafast laser deposition results, we have built a new specialized modelocked picosecond laser system for deposition of optical films and for laser formation of nanoclusters. The newly developed “state of the art” powerful Nd:YVO laser can operate over a wide range of wavelengths, intensities, and repetition rates in MHz range. A brief description of the 50W laser installation is presented.

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