Silicon surface passivation using thin HfO2 films by atomic layer deposition
2015 ◽
Vol 357
◽
pp. 635-642
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2017 ◽
Vol 3
(6)
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pp. 1600491
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2010 ◽
Vol 4
(1-2)
◽
pp. 10-12
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2014 ◽
Vol 53
(4S)
◽
pp. 04ER19
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Keyword(s):
2015 ◽
Vol 7
(24)
◽
pp. 13154-13163
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Keyword(s):