Atomic layer deposited dielectric and/or semiconducting oxide bilayers for crystalline silicon surface passivation
Keyword(s):
Keyword(s):
Keyword(s):
2015 ◽
Vol 357
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pp. 635-642
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2007 ◽
Vol 91
(2-3)
◽
pp. 174-179
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2015 ◽
Vol 212
(8)
◽
pp. 1795-1799
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2008 ◽
Vol 16
(7)
◽
pp. 615-627
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