On the synergy manipulation between the activation temperature, surface resistance and secondary electron yield of NEG thin films

2021 ◽  
pp. 152101
Author(s):  
Sihui Wang ◽  
Bangle Zhu ◽  
Yonghao Gao ◽  
Xin Shu ◽  
Wei Wei ◽  
...  
Keyword(s):  
Thin Films ◽  
Surface Resistance ◽  
Secondary Electron ◽  
Activation Temperature ◽  
Secondary Electron Yield ◽  
Electron Yield ◽  
Temperature Surface

scholarly journals Comparison of Carbon Thin Films with Low Secondary Electron Yield Deposited in Neon and Argon

Coatings ◽  
2020 ◽  
Vol 10 (9) ◽  
pp. 884
Author(s):  
Yuxin Zhang ◽  
Yigang Wang ◽  
Sihui Wang ◽  
Wei Wei ◽  
Xiaoqin Ge ◽  
...  
Keyword(s):  
Thin Films ◽  
Raman Spectroscopy ◽  
Amorphous Carbon ◽  
Secondary Electron ◽  
High Energy ◽  
Carbon Coatings ◽  
Secondary Electron Yield ◽  
Electron Yield ◽  
Carbon Thin Films ◽  
Amorphous Carbon Coatings

Modification of vacuum chamber surface properties by introducing a layer of material with low secondary electron yield (SEY) is one of the most useful solutions to suppress the electron-cloud in high-energy particle accelerators. In the present work, amorphous carbon thin films have been produced by DC magnetron sputtering with Neon and Argon sputtering gases. Microstructures of the thin films have been characterized by using scanning electron microscopy (SEM) and atomic force microscopy (AFM). The sp2 and sp3 hybridized carbon atoms are evaluated using X-ray photoelectron spectroscopy (XPS) and Raman spectroscopy. The amorphous carbon coatings comprise tiny granularities of tens of nanometers. The amorphous carbon films show more graphite-like properties as revealed by XPS and Raman spectroscopy. The secondary electron emission measurement results indicate that amorphous carbon coatings present SEY of <1.2. The thin film deposited by Ne exhibits a higher sp2 hybridization content, leading to a slightly lower SEY compared with the film produced with Ar.

scholarly journals Cryogenic surface resistance of copper: Investigation of the impact of surface treatments for secondary electron yield reduction

2019 ◽  
Vol 22 (6) ◽  
Author(s):  
Sergio Calatroni ◽  
Marco Arzeo ◽  
Sarah Aull ◽  
Marcel Himmerlich ◽  
Pedro Costa Pinto ◽  
...  
Keyword(s):  
Surface Resistance ◽  
Secondary Electron ◽  
Surface Treatments ◽  
Yield Reduction ◽  
Secondary Electron Yield ◽  
Electron Yield ◽  
The Impact

scholarly journals Extreme UV secondary electron yield measurements of Ru, Sn, and Hf oxide thin films

2019 ◽  
Vol 18 (03) ◽  
pp. 1
Author(s):  
Jacobus M. Sturm ◽  
Feng Liu ◽  
Erik Darlatt ◽  
Michael Kolbe ◽  
Antonius A. I. Aarnink ◽  
...  
Keyword(s):  
Thin Films ◽  
Secondary Electron ◽  
Oxide Thin Films ◽  
Secondary Electron Yield ◽  
Electron Yield ◽  
Extreme Uv

Secondary electron yield of SiO2 and Si3N4 thin films for continuous dynode electron multipliers

1991 ◽  
Vol 48-49 ◽  
pp. 464-471 ◽  
Author(s):  
J.J. Fijol ◽  
A.M. Then ◽  
G.W. Tasker ◽  
R.J. Soave
Keyword(s):  
Thin Films ◽  
Secondary Electron ◽  
Secondary Electron Yield ◽  
Electron Yield

Monte Carlo Modelling of Secondary Electron Yield from Rough Surfaces

1990 ◽  
Vol 48 (1) ◽  
pp. 422-423
Author(s):  
John C. Russ
Keyword(s):  
Monte Carlo ◽  
Energy Loss ◽  
Secondary Electron ◽  
Secondary Electron Emission ◽  
Analytical Calculation ◽  
Mean Free Path ◽  
Single Scattering ◽  
High Energy ◽  
Secondary Electron Yield ◽  
Electron Yield

Monte-Carlo programs are well recognized for their ability to model electron beam interactions with samples, and to incorporate boundary conditions such as compositional or surface variations which are difficult to handle analytically. This success has been especially powerful for modelling X-ray emission and the backscattering of high energy electrons. Secondary electron emission has proven to be somewhat more difficult, since the diffusion of the generated secondaries to the surface is strongly geometry dependent, and requires analytical calculations as well as material parameters. Modelling of secondary electron yield within a Monte-Carlo framework has been done using multiple scattering programs, but is not readily adapted to the moderately complex geometries associated with samples such as microelectronic devices, etc.This paper reports results using a different approach in which simplifying assumptions are made to permit direct and easy estimation of the secondary electron signal from samples of arbitrary complexity. The single-scattering program which performs the basic Monte-Carlo simulation (and is also used for backscattered electron and EBIC simulation) allows multiple regions to be defined within the sample, each with boundaries formed by a polygon of any number of sides. Each region may be given any elemental composition in atomic percent. In addition to the regions comprising the primary structure of the sample, a series of thin regions are defined along the surface(s) in which the total energy loss of the primary electrons is summed. This energy loss is assumed to be proportional to the generated secondary electron signal which would be emitted from the sample. The only adjustable variable is the thickness of the region, which plays the same role as the mean free path of the secondary electrons in an analytical calculation. This is treated as an empirical factor, similar in many respects to the λ and ε parameters in the Joy model.

Measurements of Secondary Electron Yield From Materials With Application to Depressed Collectors

2005 ◽  
Author(s):  
Edi Schamiloglu ◽  
Mark Gilmore
Keyword(s):  
Secondary Electron ◽  
Secondary Electron Yield ◽  
Electron Yield

Relationship Between Secondary-Electron Yield and Structure of Polycrystalline Diamond Prepared Under Different Methane Concentrations

2018 ◽  
Vol 47 (8) ◽  
pp. 4823-4830 ◽  
Author(s):  
Kongting Wei ◽  
Shengli Wu ◽  
Qiang Wei ◽  
Pu Zheng ◽  
Wenbo Hu ◽  
...  
Keyword(s):  
Secondary Electron ◽  
Polycrystalline Diamond ◽  
Secondary Electron Yield ◽  
Electron Yield ◽  
Methane Concentrations

Secondary electron yield measurements from limiter materials in the Joint European Torus

1985 ◽  
Vol 162 (1-3) ◽  
pp. A626
Author(s):  
M.E. Woods ◽  
B.J. Hopkins ◽  
G.M. McCracken
Keyword(s):  
Secondary Electron ◽  
Secondary Electron Yield ◽  
Electron Yield
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